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1. (WO2011142377) SHEET FOR MASK
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2011/142377    International Application No.:    PCT/JP2011/060826
Publication Date: 17.11.2011 International Filing Date: 11.05.2011
Chapter 2 Demand Filed:    29.07.2011    
A62B 18/02 (2006.01), D06M 11/79 (2006.01), D06M 13/328 (2006.01), D06M 13/463 (2006.01), D06M 15/643 (2006.01), D06M 17/00 (2006.01)
Applicants: KOWA CO., LTD. [JP/JP]; 6-29, Nishiki 3-chome, Naka-ku, Nagoya-shi, Aichi 4608625 (JP) (For All Designated States Except US).
MATSUO Kazuhiko [JP/JP]; (JP) (For US Only).
YOKOTA Mitsuru [JP/JP]; (JP) (For US Only).
SUGAYA Sueo [JP/JP]; (JP) (For US Only)
Inventors: MATSUO Kazuhiko; (JP).
YOKOTA Mitsuru; (JP).
Agent: OGURI Shohei; Eikoh Patent Firm, Toranomon East Bldg. 10F, 7-13, Nishi-Shimbashi 1-chome, Minato-ku, Tokyo 1050003 (JP)
Priority Data:
2010-108992 11.05.2010 JP
(JA) マスク用シート
Abstract: front page image
(EN)Disclosed is a sheet for a mask, which has an excellent preventive activity on the attachment of pollen dust. Specifically disclosed are: a sheet for a mask, which comprises a base material that is coated with a coating agent comprising a silicon compound and a cationic antistatic agent; and a mask produced using the sheet. The sheet for a mask and the mask have an excellent preventive activity on the attachment of pollen dust.
(FR)L'invention concerne une feuille conçue pour un masque, qui possède une excellente activité préventive sur la fixation des poussières de pollen. Plus précisément, l'invention concerne une feuille pour masque, qui comprend un matériau de base revêtu d'un agent d'enrobage comprenant un composé de silicium et un agent antistatique cationique; ainsi qu'un masque produit à l'aide de la feuille. Ladite feuille pour masque et le masque possèdent une excellente activité préventive sur la fixation des poussières de pollen.
(JA) 花粉の付着防止能に優れたマスク用シートを提供することを課題とする。 本発明は、シリコン系化合物およびカチオン系帯電防止剤を含むコーティング剤で被覆した基材を含むマスク用シート、および該マスク用シートを用いるマスクを提供する。本発明によれば、花粉付着防止能に優れたマスク用シートおよびマスクを得ることができる。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)