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Machine translation
1. (WO2011140400) SURFACE TEXTURE CONFIGURATION FOR SELF-RETAINING SUTURES AND METHODS FOR FORMING SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2011/140400    International Application No.:    PCT/US2011/035431
Publication Date: 10.11.2011 International Filing Date: 05.05.2011
IPC:
A61B 17/03 (2006.01), A61B 17/064 (2006.01), D02J 3/00 (2006.01)
Applicants: ETHICON, INC. [US/US]; P.O. Box 151 U.S. Route 22 Somerville, NJ 08876 (US) (For US Only).
ETHICON, LLC [US/US]; Road 183 KM 8.3, Hato Industrial Area San Lorenzo, Puerto Rico 00754 (US) (For All Designated States Except US).
HUNTER, William, L. [CA/CA]; (CA) (For US Only).
GROSS, Jeffrey, M. [US/US]; (US) (For US Only).
AVELAR, Rui [CA/CA]; (CA) (For US Only)
Inventors: HUNTER, William, L.; (CA).
GROSS, Jeffrey, M.; (US).
AVELAR, Rui; (CA)
Agent: SZANTO, Melissa, J.; Johnson & Johnson One Johnson & Johnson Plaza New Brunswick, NJ 08933-7003 (US)
Priority Data:
61/331,629 05.05.2010 US
Title (EN) SURFACE TEXTURE CONFIGURATION FOR SELF-RETAINING SUTURES AND METHODS FOR FORMING SAME
(FR) CONFIGURATION DE TEXTURE SUPERFICIELLE POUR SUTURES À AUTO-RETENUE ET LEURS PROCÉDÉS DE FORMATION
Abstract: front page image
(EN)A tissue retaining device includes a flexible suture thread having a surface microtexture and/or nanotexture. The surface microtexture and/or nanotexture filament is directional in that the resulting suture thread has a lower resistance to moving through tissue in the direction of intended deployment than in the reverse direction. A variety of alternative asymmetric textural elements and/or distributions of textural elements are disclosed. Methods for manufacturing the surface microtexture and/or nanotexture are also described.
(FR)La présente invention concerne un dispositif de retenue tissulaire comportant un fil de suture souple présentant une micro-texture et/ou une nano-texture superficielle. Le filament de micro-texture et/ou une nano-texture superficielle est directionnel en ce sens que le fil de suture qui en est obtenu présente une résistance au déplacement à travers le tissu dans la direction de déploiement prévue inférieure à celle dans la direction inverse. L'invention concerne une variété d'éléments de texture asymétriques et/ou des distributions d'éléments de texture alternatifs. L'invention concerne également des procédés pour la fabrication de micro-texture et/ou une nano-texture superficielle.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)