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Machine translation
1. (WO2011139782) SEPARATION CONTROL SUBSTRATE/TEMPLATE FOR NANOIMPRINT LITHOGRAPHY
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2011/139782    International Application No.:    PCT/US2011/034159
Publication Date: 10.11.2011 International Filing Date: 27.04.2011
IPC:
G03F 7/00 (2006.01)
Applicants: MOLECULAR IMPRINTS, INC. [US/US]; 1807 West Braker Ln, Bldg. C-100 Austin, Texas 78758-3605 (US) (For All Designated States Except US)
Inventors: IM, Se-Hyuk; (US).
GANAPATHISUBRAMANIAN, Mahadevan; (US).
FLETCHER, Edward B.; (US).
KHUSNATDINOV, Niyaz; (US).
SCHMID, Gerard M.; (US).
MEISSL, Mario Johannes; (US).
CHERALA, Anshuman; (US).
XU, Frank Y.; (US).
CHOI, Byung-Jin; (US).
SREENIVASAN, Sidlgata V.; (US)
Agent: KING, Cameron A.; PO Box 81536 Austin, Texas 78708 (US)
Priority Data:
61/328,353 27.04.2010 US
Title (EN) SEPARATION CONTROL SUBSTRATE/TEMPLATE FOR NANOIMPRINT LITHOGRAPHY
(FR) SÉPARATION SÛRE POUR UNE NANO-IMPRESSION
Abstract: front page image
(EN)Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.
(FR)L'invention porte sur la commande d'une déformation latérale et d'un rapport de déformation latérale (dt/db) entre un gabarit et un substrat par la sélection des épaisseurs du gabarit et/ou du substrat (Tt et/ou Tb), la commande de la contre-pression du gabarit et/ou du substrat (Pt et/ou Pb), et/ou la sélection d'une rigidité de matériau.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)