WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2011136525) INLINE SUBSTRATE-TREATING APPARATUS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2011/136525    International Application No.:    PCT/KR2011/003002
Publication Date: 03.11.2011 International Filing Date: 25.04.2011
IPC:
H01L 31/18 (2006.01), H01L 31/042 (2006.01)
Applicants: TERASEMICON CORPORATION [KR/KR]; 164-5 Jangji-ri, Dongtan-myeon, Hwaseong-si Gyeonggi-do 445-812 (KR) (For All Designated States Except US).
KIM, Su Woong [KR/KR]; (KR) (For US Only).
LEE, Kyung Ho [KR/KR]; (KR) (For US Only).
JUNG, Soon Bin [KR/KR]; (KR) (For US Only)
Inventors: KIM, Su Woong; (KR).
LEE, Kyung Ho; (KR).
JUNG, Soon Bin; (KR)
Agent: KIM, Han; Nova B/D 2F. 641-3, Yeoksam-dong, Kangnam-gu Seoul 135-909 (KR)
Priority Data:
10-2010-0038603 26.04.2010 KR
Title (EN) INLINE SUBSTRATE-TREATING APPARATUS
(FR) APPAREIL DE TRAITEMENT DE SUBSTRAT EN LIGNE
(KO) 인라인 기판 처리 장치
Abstract: front page image
(EN)Disclosed is an inline substrate-treating apparatus. The inline substrate-treating apparatus according to the present invention comprises a first chamber (100) in which a substrate (10) is pre-heated; a second chamber (200) in which the substrate (10) pre-heated in the first chamber (100) is transferred, heated and plasma-treated; and a third chamber (300) in which the substrate (10) plasma-treated in the second chamber (200) is transferred, cooled and plasma-treated, wherein the first chamber (100), the second chamber (200) and the third chamber (300) are sequentially connected and arranged in a line.
(FR)L'invention porte sur un appareil de traitement de substrat en ligne. L'appareil de traitement de substrat en ligne selon la présente invention comprend une première chambre (100) dans laquelle un substrat (10) est préchauffé; une deuxième chambre (200) dans laquelle le substrat (10) préchauffé dans la première chambre (100) est transféré, chauffé et traité au plasma; et une troisième chambre (300) dans laquelle le substrat (10) traité au plasma dans la deuxième chambre (200) est transféré, refroidi et traité au plasma, la première chambre (100), la deuxième chambre (200) et la troisième chambre (300) étant reliées en séquence et disposées en ligne.
(KO)인라인 기판 처리 장치가 개시된다. 본 발명에 따른 인라인 기판 처리 장치는 기판(10)을 예열하는 제1 챔버(100); 제1 챔버(100)에서 예열된 기판(10)을 전달받아 가열하면서 플라즈마 처리하는 제2 챔버(200); 및 제2 챔버(200)에서 플라즈마 처리된 기판(10)을 전달받아 냉각하면서 플라즈마 처리하는 제3 챔버(300)를 포함하고, 제1 챔버(100), 제2 챔버(200) 및 제3 챔버(300)는 순차적으로 일렬로 연결되어 배치된 구성이다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)