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1. (WO2011107564) PATTERN GENERATORS COMPRISING A CALIBRATION SYSTEM
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2011/107564 International Application No.: PCT/EP2011/053241
Publication Date: 09.09.2011 International Filing Date: 03.03.2011
Chapter 2 Demand Filed: 03.01.2012
IPC:
G03F 7/20 (2006.01) ,G03F 9/00 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
9
Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Applicants: SVENSSON, Anders[SE/SE]; SE (UsOnly)
JONSSON, Fredrik[SE/SE]; SE (UsOnly)
MICRONIC MYDATA AB[SE/SE]; Box 3141 S-183 03 Täby, SE (AllExceptUS)
Inventors: SVENSSON, Anders; SE
JONSSON, Fredrik; SE
Common
Representative:
MICRONIC MYDATA AB; Box 3141 S-183 03 Täby, SE
Priority Data:
61/282,58403.03.2010US
Title (EN) PATTERN GENERATORS COMPRISING A CALIBRATION SYSTEM
(FR) GÉNÉRATEURS DE MOTIF COMPRENANT UN SYSTÈME D'ÉTALONNAGE
Abstract:
(EN) A pattern generator includes: a writing tool and a calibration system. The writing tool is configured to generate a pattern on a workpiece arranged on a stage. The calibration system is configured to determine a correlation between a coordinate system of the writing tool and a coordinate system of a calibration plate on one of the stage and the workpiece. The calibration system is also configured to determine the correlation at least partly based on an optical correlation signal, or pattern, in a form of at least one optical beam being reflected from at least one reflective pattern on the surface of the calibration plate.
(FR) L'invention porte sur un générateur de motif qui comprend : un outil d'écriture et un système d'étalonnage. L'outil d'écriture est conçu pour produire un motif sur une pièce agencée sur une platine. Le système d'étalonnage est conçu pour déterminer une corrélation entre un système de coordonnées de l'outil d'écriture et un système de coordonnées d'une plaque d'étalonnage sur l'un de la platine et de la pièce. Le système d'étalonnage est aussi conçu pour déterminer la corrélation, au moins partiellement sur la base d'un signal, ou motif, de corrélation optique, sous la forme d'au moins un faisceau optique qui est réfléchi par au moins un motif réfléchissant présent sur la surface de la plaque d'étalonnage.
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)