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1. WO2011092274 - ARRANGEMENT FOR MEASURING THE CONCENTRATION OF OXYGEN IN THE EXHAUST GAS REGION OF A FURNACE

Publication Number WO/2011/092274
Publication Date 04.08.2011
International Application No. PCT/EP2011/051188
International Filing Date 28.01.2011
IPC
G01J 3/433 2006.1
GPHYSICS
01MEASURING; TESTING
JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
3Spectrometry; Spectrophotometry; Monochromators; Measuring colours
28Investigating the spectrum
42Absorption spectrometry; Double-beam spectrometry; Flicker spectrometry; Reflection spectrometry
433Modulation spectrometry; Derivative spectrometry
G01N 21/27 2006.1
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
17Systems in which incident light is modified in accordance with the properties of the material investigated
25Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
27using photo-electric detection
G01N 21/35 2006.1
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
17Systems in which incident light is modified in accordance with the properties of the material investigated
25Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
31Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
35using infra-red light
G01N 21/39 2006.1
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
17Systems in which incident light is modified in accordance with the properties of the material investigated
25Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
31Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
39using tunable lasers
CPC
G01N 2021/399
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
17Systems in which incident light is modified in accordance with the properties of the material investigated
25Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
31Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
39using tunable lasers
396Type of laser source
399Diode laser
G01N 21/274
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
17Systems in which incident light is modified in accordance with the properties of the material investigated
25Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
27using photo-electric detection
274Calibration, base line adjustment, drift correction
G01N 21/3504
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
17Systems in which incident light is modified in accordance with the properties of the material investigated
25Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
31Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
35using infra-red light
3504for analysing gases, e.g. multi-gas analysis
G01N 21/39
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
17Systems in which incident light is modified in accordance with the properties of the material investigated
25Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
31Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
39using tunable lasers
G01N 2201/0634
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
2201Features of devices classified in G01N21/00
06Illumination; Optics
063Illuminating optical parts
0634Diffuse illumination
G01N 2201/0636
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
2201Features of devices classified in G01N21/00
06Illumination; Optics
063Illuminating optical parts
0636Reflectors
Applicants
  • SIEMENS AKTIENGESELLSCHAFT [DE]/[DE] (AllExceptUS)
  • CHEN, Jia [CN]/[DE] (UsOnly)
  • HANGAUER, Andreas [DE]/[DE] (UsOnly)
  • STRZODA, Rainer [DE]/[DE] (UsOnly)
Inventors
  • CHEN, Jia
  • HANGAUER, Andreas
  • STRZODA, Rainer
Common Representative
  • SIEMENS AKTIENGESELLSCHAFT
Priority Data
10000921.629.01.2010EP
Publication Language German (de)
Filing Language German (DE)
Designated States
Title
(DE) ANORDNUNG ZUR KONZENTRATIONSMESSUNG VON SAUERSTOFF IM ABGASBEREICH EINER FEUERUNGSANLAGE
(EN) ARRANGEMENT FOR MEASURING THE CONCENTRATION OF OXYGEN IN THE EXHAUST GAS REGION OF A FURNACE
(FR) SYSTÈME DE MESURE DE CONCENTRATION D'OXYGÈNE DANS LA ZONE DE GAZ BRÛLÉS D'UNE INSTALLATION DE COMBUSTION
Abstract
(DE) Anordnung zur Konzentrationsmessung von Sauerstoff im Abgasbereich einer Feuerungsanlage mit einer monochromen über Wellenlängenbereiche im Bereich der jeweiligen Molekülabsorptionsbande durchs timmbaren Lichtquelle (2,7) in Form einer VCSEL zur Emission von Licht im Bereich von 763 nm Wellenlänge, wobei ein Verfahren der "Tunable Diode Laser Spectroscopy" (TDLS) anwendbar ist, einer Absorptionsmessstrecke, welche das Messgas beinhaltet, einer Photodiode (3) zur Aufnahme von reflektiertem Licht, wobei ein einfach gefalteter Strahlengang in der Messanordnung vorliegt und eine diffus reflektierende Oberfläche vorhanden ist, einem als Auswerteeinheit ausgestalteten Mikroprozessor zur Aufnahme von Messwerten und Ermittlung der Konzentration von Sauerstoff mittels eines nichtlinearen Fit -Algorithmus, wobei der Algorithmus die folgenden Schritte, angewandt auf das zweite harmonische Spektrum, umfasst: a) Bestimmung der Position eines Maximums und zweier benachbarter Minima in einem gemessenen Spektrum und Bestimmung der Position einer Absorptionslinie aus den Positionen des Maximums und des Mittelwerts der Positionen der Minima, b) Bildung des Mittelwerts der Intensitätswerte des Spektrums, c) Bestimmung eines Maximum-zu-Minimum-Verhältnisses unter Berücksichtigung des Mittelwerts, d) Bestimmung eines Startwerts für einen Wellenlängenskalenfaktor aus dem Abstand zweier Nulldurchgänge des Spektrums und dem Maximum- zu-Minimum-Verhältnis, e) Kaiman-Filterung eines ermittelten Werts für die Gaskonzentration.
(EN) Arrangement for measuring the concentration of oxygen in the exhaust gas region of a furnace, having a monochromatic light source (2,7) in the form of a VCSEL which can be tuned via wavelength ranges in the range of the respective molecule absorption bands and is intended to emit light at a wavelength of 763 nm, wherein a "Tunable Diode Laser Spectroscopy" (TDLS) method can be used, having an absorption measuring path which comprises the measurement gas, having a photodiode (3) for picking up reflected light, wherein a singly folded beam path is present in the measuring arrangement and there is a diffusely reflective surface, and having a microprocessor which is in the form of an evaluation unit and is intended to receive measured values and to determine the concentration of oxygen using a non-linear fit algorithm, wherein the algorithm comprises the following steps, applied to the second harmonic spectrum: a) determination of the position of a maximum and two adjacent minima in a measured spectrum and determination of the position of an absorption line from the positions of the maximum and the average value of the positions of the minima, b) formation of the average value of the intensity values of the spectrum, c) determination of a maximum-to-minimum ratio taking into account the average value, d) determination of a starting value for a wavelength scale factor from the distance between two zero crossings of the spectrum and the maximum-to-minimum ratio, e) Kalman filtering of a value determined for the gas concentration.
(FR) L'invention concerne un système de mesure de concentration d'oxygène dans la zone des gaz brûlés d'une installation de combustion. Le système comprend une source lumineuse (2, 7) monochrome ajustable par l'intermédiaire des plages de longueurs d'onde dans la plage de la bande d'absorption moléculaire concernée, sous la forme d'un VCSEL (laser à cavité verticale émettant par la surface) pour émettre de la lumière dans la plage de longueur d'onde de 763 nm, un procédé de "Tunable Diode Laser Spectroscopy" (TDLS) pouvant être utilisé, un tronçon de mesure par absorption qui contient le gaz de mesure, une photodiode (3) pour recevoir la lumière réfléchie, une trajectoire de faisceau simplement pliée se trouvant dans le système de mesure et une surface à réflexion diffuse étant présente, un microprocesseur conçu comme unité d'évaluation pour enregistrer les valeurs de mesure et déterminer la concentration d'oxygène au moyen d'un algorithme Fit non linéaire, l'algorithme comprenant les étapes suivantes appliquées au deuxième spectre harmonique: a) détermination de la position d'un maximum et de deux minima voisins dans un spectre mesuré et détermination de la position d'une raie d'absorption à partir des positions du maximum et de la valeur moyenne des positions des minima, b) formation de la valeur moyenne des valeurs d'intensité du spectre, c) détermination d'un rapport maximum-minimum en tenant compte de la valeur moyenne, d) détermination d'une valeur de départ pour un facteur d'échelle de longueur d'onde à partir de la distance de deux passages par zéro du spectre et du rapport maximum-minimum, e) filtrage de Kalman d'une valeur calculée pour la concentration de gaz.
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