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1. WO2011074178 - CHARGED PARTICLE BEAM DEVICE AND SAMPLE OBSERVATION METHOD

Publication Number WO/2011/074178
Publication Date 23.06.2011
International Application No. PCT/JP2010/006640
International Filing Date 11.11.2010
IPC
H01J 37/28 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
26Electron or ion microscopes; Electron- or ion-diffraction tubes
28with scanning beams
H01J 37/16 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
16Vessels; Containers
H01J 37/20 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
20Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
H01J 37/317 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
30Electron-beam or ion-beam tubes for localised treatment of objects
317for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation
CPC
G01N 1/2813
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
1Sampling; Preparing specimens for investigation
28Preparing specimens for investigation ; including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
2813Producing thin layers of samples on a substrate, e.g. smearing, spinning-on
H01J 2237/004
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
004Charge control of objects or beams
H01J 2237/0203
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
02Details
0203Protection arrangements
H01J 2237/31745
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
30Electron or ion beam tubes for processing objects
317Processing objects on a microscale
3174Etching microareas
31745for preparing specimen to be viewed in microscopes or analyzed in microanalysers
H01J 2237/31749
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
30Electron or ion beam tubes for processing objects
317Processing objects on a microscale
31749Focused ion beam
H01J 37/28
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
26Electron or ion microscopes; Electron or ion diffraction tubes
28with scanning beams
Applicants
  • 株式会社日立ハイテクノロジーズ HITACHI HIGH-TECHNOLOGIES CORPORATION [JP]/[JP] (AllExceptUS)
  • 森川晃成 MORIKAWA, Akinari [JP]/[JP] (UsOnly)
  • 佐藤岳志 SATO, Takeshi [JP]/[JP] (UsOnly)
  • 中澤英子 NAKAZAWA, Eiko [JP]/[JP] (UsOnly)
  • 桑畑進 KUWABATA, Susumu [JP]/[JP] (UsOnly)
Inventors
  • 森川晃成 MORIKAWA, Akinari
  • 佐藤岳志 SATO, Takeshi
  • 中澤英子 NAKAZAWA, Eiko
  • 桑畑進 KUWABATA, Susumu
Agents
  • ポレール特許業務法人 Polaire I.P.C.
Priority Data
2009-28243114.12.2009JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) CHARGED PARTICLE BEAM DEVICE AND SAMPLE OBSERVATION METHOD
(FR) DISPOSITIF À FAISCEAU DE PARTICULES CHARGÉES ET PROCÉDÉ D'OBSERVATION D'ÉCHANTILLONS
(JA) 荷電粒子線装置及び試料観察方法
Abstract
(EN)
Disclosed is a charged particle beam device which includes: an ionic liquid holding member (302) having an opening (303); an ionic liquid supplying section (109) for filling the opening with an ionic liquid (301; 351); an observation section for observing the adhesion state of the ionic liquid; and charged particle beam generating sections (101, 104) for radiating charged particle beams (103, 104). The charged particle beam device is capable of adjusting the thickness of the film formed of ionic liquid with which the opening is filled, at the time of observing samples (201) in a state wherein the samples are floating in the ionic liquid by being dispersed in the ionic liquid or on the surface of the ionic liquid. Thus, the charged particle beam device is provided with the mechanism of adjusting the shape and the thickness of the film formed of the ionic liquid adhered on the sample such that the shape and the thickness are suitable for various types of observations using electronic microscope and the like, and also for processing using ion beams.
(FR)
L'invention concerne un dispositif à faisceau de particules chargées qui comprend un élément destiné à contenir du liquide ionique (302) ayant une ouverture (303) ; une section d'introduction de liquide ionique (109) destinée à introduire un liquide ionique (301 ; 351) à travers l'ouverture ; une section d'observation destinée à observer l'état d'adhérence du liquide ionique ; et des sections génératrices de faisceaux de particules chargées (101, 104) destinées à rayonner des faisceaux de particules chargées (103, 104). Le dispositif à faisceaux de particules chargées est capable d'ajuster l'épaisseur du film formé d'un liquide ionique qui est introduit par l'intermédiaire de l'ouverture, au moment de l'observation d'échantillons (201), dans un état dans lequel les échantillons flottent dans le liquide ionique en étant dispersés dans le liquide ionique ou à la surface du liquide ionique. Le dispositif à faisceau de particules chargées est ainsi doté d'un mécanisme permettant d'ajuster la forme et l'épaisseur du film formé du liquide ionique et adhérant à l'échantillon de telle façon que la forme et l'épaisseur conviennent pour divers types d'observation au moyen d'un microscope électronique ou autre, ainsi que pour un traitement utilisant des faisceaux d'ions.
(JA)
本発明の荷電粒子線装置は、開口部(303)を有するイオン液体保持部材(302)と、前記開口部にイオン液体(301;351)を充填するためのイオン液体供給部(109)と、前記イオン液体の付着状態を観察するための観察部と、荷電粒子線(103,104)を照射するための荷電粒子線発生部(101,104)とを含み、試料(201)を前記イオン液体の内部又は前記イオン液体の表面に分散させることにより、前記試料を前記イオン液体に浮かせた状態で観察する際に、前記開口部に充填する前記イオン液体の厚さを調整可能としたことを特徴とする。 これにより、電子顕微鏡等による各種観察やイオンビームによる加工に適するように、試料に付着させるイオン液体の形状及び膜厚を調整する機構を備えた荷電粒子線装置を提供できるようになった。
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