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1. WO2011062450 - SPUTTERING TARGET OF MULTI-COMPONENT SINGLE BODY AND METHOD FOR PREPARATION THEREOF, AND METHOD FOR PRODUCING MULTI-COMPONENT ALLOY-BASED NANOSTRUCTURED THIN FILMS USING SAME

Publication Number WO/2011/062450
Publication Date 26.05.2011
International Application No. PCT/KR2010/008217
International Filing Date 19.11.2010
IPC
C23C 14/34 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
34Sputtering
C23C 16/06 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
06characterised by the deposition of metallic material
B22F 3/12 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
22CASTING; POWDER METALLURGY
FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
3Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor
12Both compacting and sintering
B22F 9/08 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
22CASTING; POWDER METALLURGY
FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
9Making metallic powder or suspensions thereof; Apparatus or devices specially adapted therefor
02using physical processes
06starting from liquid material
08by casting, e.g. through sieves or in water, by atomising or spraying
CPC
B22F 9/08
BPERFORMING OPERATIONS; TRANSPORTING
22CASTING; POWDER METALLURGY
FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER
9Making metallic powder or suspensions thereof
02using physical processes
06starting from liquid material
08by casting, e.g. through sieves or in water, by atomising or spraying
C22C 1/045
CCHEMISTRY; METALLURGY
22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
CALLOYS
1Making alloys
04by powder metallurgy
045Alloys based on refractory metals
C22C 14/00
CCHEMISTRY; METALLURGY
22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
CALLOYS
14Alloys based on titanium
C22C 16/00
CCHEMISTRY; METALLURGY
22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
CALLOYS
16Alloys based on zirconium
C22C 2200/02
CCHEMISTRY; METALLURGY
22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
CALLOYS
2200Crystalline structure
02Amorphous
C23C 14/0641
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06characterised by the coating material
0641Nitrides
Applicants
  • 한국생산기술연구원 KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY [KR]/[KR] (AllExceptUS)
  • 신승용 SHIN, Seung Yong [KR]/[KR] (UsOnly)
  • 문경일 MOON, Kyoung Il [KR]/[KR] (UsOnly)
  • 선주현 SUN, Ju Hyun [KR]/[KR] (UsOnly)
  • 이장훈 LEE, Chang Hun [KR]/[KR] (UsOnly)
  • 배정찬 BAE, Jung Chan [KR]/[KR] (UsOnly)
Inventors
  • 신승용 SHIN, Seung Yong
  • 문경일 MOON, Kyoung Il
  • 선주현 SUN, Ju Hyun
  • 이장훈 LEE, Chang Hun
  • 배정찬 BAE, Jung Chan
Agents
  • 특허법인 다인 DYNE PATENT FIRM LAW
Priority Data
10-2009-011225819.11.2009KR
10-2010-011119709.11.2010KR
Publication Language Korean (KO)
Filing Language Korean (KO)
Designated States
Title
(EN) SPUTTERING TARGET OF MULTI-COMPONENT SINGLE BODY AND METHOD FOR PREPARATION THEREOF, AND METHOD FOR PRODUCING MULTI-COMPONENT ALLOY-BASED NANOSTRUCTURED THIN FILMS USING SAME
(FR) CIBLE POUR DÉPÔT PAR PULVÉRISATION FORMÉE D'UN SEUL CORPS CONSTITUÉ DE PLUSIEURS COMPOSANTS ET SON PROCÉDÉ DE PRÉPARATION, ET PROCÉDÉ DE PRODUCTION DE COUCHES MINCES NANOSTRUCTURÉES À BASE D'ALLIAGES À PLUSIEURS COMPOSANTS AU MOYEN DE CETTE CIBLE
(KO) 다성분 단일체의 스퍼터링 타겟 및 그 제조방법, 이를 이용한 다성분 합금계 나노구조 박막 제조방법
Abstract
(EN)
The present invention relates to a sputtering target of a multi-component single body, a method for the preparation thereof, and a method for producing multi-component alloy-based nanostructured thin films using same. The sputtering target of a multi-component single body according to the present invention comprises: an amorphous or partially-crystallized glass-forming alloy system of a nitride-forming metallic element that can react with nitrogen to form nitride, and of a non-nitride forming metallic element that exhibits no or low solid solubility for said nitride-forming metallic element and does not react with nitrogen or has low reactivity therewith. Said nitride-forming metallic element comprises at least one element selected from Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Al and Si, and said non-nitride forming metallic element comprises at least one element selected from Mg, Ca, Sc, Ni, Cu, Y, Ag, In, Sn, La, Au and Pb.
(FR)
La présente invention concerne une cible pour dépôt par pulvérisation formée d'un seul corps constitué de plusieurs composants et son procédé de préparation, et un procédé de production de couches minces nanostructurées à base d'alliages à plusieurs composants au moyen de cette cible. La cible de l'invention comprend un système de formation d'alliage amorphe ou partiellement cristallin composé d'éléments métalliques pouvant réagir avec l'azote pour former des nitrures et d'éléments métalliques ne formant pas de nitrures, réagissant peu ou pas avec l'azote et étant peu ou pas solubles à l'état solide dans lesdits éléments métalliques formant des nitrures. Lesdits éléments métalliques formant des nitrures comprennent au moins un élément choisi parmi Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Al et Si, et lesdits éléments ne formant pas de nitrures comprennent au moins un élément choisi parmi Mg, Ca, Sc, Ni, Cu, Y, Ag, In, Sn, La, Au et Pb.
(KO)
본 발명은 다성분 단일체의 스퍼터링 타겟 및 그 제조방법, 이를 이용한 다성분 합금계 나노구조 박막 제조방법에 관한 것으로, 본 발명에 따른 다성분 단일체의 스퍼터링 타겟은, 질소와 반응하여 질화물 형성이 가능한 질화물형성 금속원소 및 상기 질화물형성 금속원소에 대한 고용도가 없거나 낮고 질소와 반응하지 않거나 반응성이 낮은 비질화물형성 금속원소의 비정질 또는 부분결정화된 비정질형성 합금계를 포함하는 것으로, 상기 질화물형성 금속원소는 Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Al, Si로부터 선택된 적어도 하나의 원소를 포함하고, 상기 비질화물형성 금속원소는 Mg, Ca, Sc, Ni, Cu, Y, Ag, In, Sn, La, Au, Pb로부터 선택된 적어도 하나의 원소를 포함하여 구성될 수 있다.
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