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1. WO2011037195 - COLORING COMPOSITION AND COLOR FILTER

Publication Number WO/2011/037195
Publication Date 31.03.2011
International Application No. PCT/JP2010/066577
International Filing Date 24.09.2010
IPC
G02B 5/20 2006.01
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5Optical elements other than lenses
20Filters
G02B 5/22 2006.01
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5Optical elements other than lenses
20Filters
22Absorbing filters
G02F 1/1335 2006.01
GPHYSICS
02OPTICS
FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01for the control of the intensity, phase, polarisation or colour
13based on liquid crystals, e.g. single liquid crystal display cells
133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
1333Constructional arrangements
1335Structural association of cells with optical devices, e.g. polarisers or reflectors
G03F 7/004 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
G03F 7/032 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
032with binders
CPC
G02B 5/223
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5Optical elements other than lenses
20Filters
22Absorbing filters
223containing organic substances, e.g. dyes, inks or pigments
G03F 7/0007
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
0007Filters, e.g. additive colour filters; Components for display devices
Applicants
  • 東洋インキSCホールディングス株式会社 TOYO INK SC HOLDINGS CO., LTD. [JP]/[JP] (AllExceptUS)
  • トーヨーケム株式会社 TOYOCHEM CO., LTD. [JP]/[JP] (AllExceptUS)
  • 中村 高士 NAKAMURA, Takashi (UsOnly)
  • 山崎 智己 YAMAZAKI, Tomomi (UsOnly)
  • 尾立 嘉岳 ORYU, Yoshitake (UsOnly)
Inventors
  • 中村 高士 NAKAMURA, Takashi
  • 山崎 智己 YAMAZAKI, Tomomi
  • 尾立 嘉岳 ORYU, Yoshitake
Agents
  • 蔵田 昌俊 KURATA, Masatoshi
Priority Data
2009-22041125.09.2009JP
2009-26347819.11.2009JP
2010-04406401.03.2010JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) COLORING COMPOSITION AND COLOR FILTER
(FR) COMPOSITION COLORANTE ET FILTRE COLORÉ
(JA) 着色組成物及びカラーフィルタ
Abstract
(EN)
Disclosed are: a color filter having excellent color properties, heat resistance, light resistance and solvent resistance; and a coloring composition for use in the production of the color filter. Specifically disclosed is a coloring composition for a color filter, which comprises a transparent resin and a coloring agent. The coloring agent comprises a salt-forming product of a basic dye and a counter compound that is an anionic component. The counter compound has a molecular weight of 200 to 3500.
(FR)
L'invention porte sur un filtre coloré ayant d'excellentes propriétés chromatiques, une excellente résistance à la chaleur, une excellente résistance à la lumière et une excellente résistance aux solvants ; et sur une composition colorante destinée à être utilisée dans la fabrication du filtre coloré. De façon spécifique, l'invention porte sur une composition colorante pour un filtre coloré, qui comprend une résine transparente et un agent colorant. L'agent colorant comprend un produit de formation de sel d'un colorant basique et d'un contre-composé qui est un composant anionique. Le contre-composé a une masse moléculaire de 200 à 3 500.
(JA)
 色特性、耐熱性、耐光性及び耐溶剤性に優れたカラーフィルタ及びその製造に使用する着色組成物が提供される。カラーフィルタ用着色組成物は、透明樹脂と着色剤とを含有している。この着色剤は、塩基性染料とアニオン成分であるカウンタ化合物とからなる造塩生成物を含んでいる。カウンタ化合物の分子量は200乃至3500の範囲内にある。
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