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1. WO2011037073 - PROCESS FOR PRODUCTION OF TRANS CYCLIC POLYPHENOL COMPOUNDS

Publication Number WO/2011/037073
Publication Date 31.03.2011
International Application No. PCT/JP2010/066097
International Filing Date 16.09.2010
IPC
C07C 37/20 2006.01
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
CACYCLIC OR CARBOCYCLIC COMPOUNDS
37Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom of a six-membered aromatic ring
11by reactions increasing the number of carbon atoms
20using aldehydes or ketones
C07C 39/17 2006.01
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
CACYCLIC OR CARBOCYCLIC COMPOUNDS
39Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
12polycyclic with no unsaturation outside the aromatic rings
17containing other rings in addition to the six-membered aromatic rings
G03F 7/004 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
G03F 7/038 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
038Macromolecular compounds which are rendered insoluble or differentially wettable
H01L 21/027 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02Manufacture or treatment of semiconductor devices or of parts thereof
027Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
CPC
C07C 2601/14
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
CACYCLIC OR CARBOCYCLIC COMPOUNDS
2601Systems containing only non-condensed rings
12with a six-membered ring
14The ring being saturated
C07C 37/20
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
CACYCLIC OR CARBOCYCLIC COMPOUNDS
37Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom of a six-membered aromatic ring
11by reactions increasing the number of carbon atoms
20using aldehydes or ketones
G03F 7/038
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
038Macromolecular compounds which are rendered insoluble or differentially wettable
Applicants
  • 三菱瓦斯化学株式会社 MITSUBISHI GAS CHEMICAL COMPANY, INC. [JP]/[JP] (AllExceptUS)
  • 岡田 悠 OKADA, Yu [JP]/[JP] (UsOnly)
Inventors
  • 岡田 悠 OKADA, Yu
Agents
  • 大谷 保 OHTANI, Tamotsu
Priority Data
2009-21916824.09.2009JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) PROCESS FOR PRODUCTION OF TRANS CYCLIC POLYPHENOL COMPOUNDS
(FR) PROCÉDÉ POUR LA PRODUCTION DE COMPOSÉS DE POLYPHÉNOL CYCLIQUES TRANS
(JA) トランス環状ポリフェノール化合物の製造方法
Abstract
(EN)
A process for selective production of low-molecular trans cyclic polyphenol compounds represented by general formula (3) [wherein L, R1, m, and R' are each as defined in the description]. The process includes a step of reacting at least one phenol compound with at least one aldehyde compound in the presence of a catalyst with the amount of water in the reaction system at the time of initiation of the reaction being controlled within the range of 0 to 50 parts by weight per 100 parts of weight of the phenol compound charged.
(FR)
Procédé pour la production sélective de composés de polyphénol cycliques trans de faible poids moléculaire représentés par la formule générale (3) [dans laquelle L, R1, m, et R' sont chacun tels que définis dans la description]. Le procédé comprend une étape de réaction d'au moins un composé phénolique avec au moins un composé aldéhyde en présence d'un catalyseur, la quantité d'eau dans le système de réaction au moment de l'initiation de la réaction étant contrôlée dans la plage de 0 à 50 parties en poids pour 100 parties en poids du composé phénolique chargé.
(JA)
 下記式(3):(式中、L、R1、m、およびR'は明細書において定義したとおり)で表される低分子量トランス環状ポリフェノール化合物の選択的製造方法。選択的製造方法は、少なくとも1種のフェノール化合物と少なくとも1種のアルデヒド化合物とを触媒の存在下で、反応開始時の反応系内の水分量をフェノール化合物の仕込量100重量部に対して0~50重量部の範囲に制御して反応させる工程を含む。
Also published as
Latest bibliographic data on file with the International Bureau