Processing

Please wait...

Settings

Settings

Goto Application

1. WO2011036923 - METHOD FOR PROCESSING WASTE SOLUTION IN PLATE-MAKING PROCESS OF PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE

Publication Number WO/2011/036923
Publication Date 31.03.2011
International Application No. PCT/JP2010/060396
International Filing Date 18.06.2010
IPC
G03F 7/30 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26Processing photosensitive materials; Apparatus therefor
30Imagewise removal using liquid means
G03F 7/32 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26Processing photosensitive materials; Apparatus therefor
30Imagewise removal using liquid means
32Liquid compositions therefor, e.g. developers
CPC
G03F 7/3092
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26Processing photosensitive materials; Apparatus therefor
30Imagewise removal using liquid means
3092Recovery of material; Waste processing
G03F 7/322
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26Processing photosensitive materials; Apparatus therefor
30Imagewise removal using liquid means
32Liquid compositions therefor, e.g. developers
322Aqueous alkaline compositions
Applicants
  • 富士フイルム株式会社 FUJIFILM Corporation [JP]/[JP] (AllExceptUS)
  • 青島 徳生 AOSHIMA, Norio [JP]/[JP] (UsOnly)
  • 渡辺 年宏 WATANABE, Toshihiro [JP]/[JP] (UsOnly)
  • 小林 史和 KOBAYASHI, Fumikazu [JP]/[JP] (UsOnly)
Inventors
  • 青島 徳生 AOSHIMA, Norio
  • 渡辺 年宏 WATANABE, Toshihiro
  • 小林 史和 KOBAYASHI, Fumikazu
Agents
  • 中島 淳 NAKAJIMA, Jun
Priority Data
2009-22061225.09.2009JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) METHOD FOR PROCESSING WASTE SOLUTION IN PLATE-MAKING PROCESS OF PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE
(FR) PROCÉDÉ DE TRAITEMENT DE SOLUTION RÉSIDUELLE DANS UN PROCESSUS DE FABRICATION DE PLAQUES D'IMPRESSION LITHOGRAPHIQUE PHOTOSENSIBLES
(JA) 感光性平版印刷版の製版処理廃液の処理方法
Abstract
(EN)
Disclosed is a method for processing waste solution in the plate-making process of a photosensitive lithographic printing plate, wherein the maintenance performance of the equipment is excellent. Specifically disclosed is a method for processing waste solution in the plate-making process, wherein the waste solution in the plate-making process, which is discharged when the plate-making process of a photosensitive lithographic printing plate is carried out using a developer liquid for a photosensitive lithographic printing plate, said developer liquid being characterized by containing at least one sugar selected from non-reducing sugars and at least one base without containing a silicate and by having a pH within the range of 9.0-13.5, is evaporated and concentrated by an evaporative concentration apparatus, thereby being separated into water vapor and the dissolved component. In the method for processing waste solution in the plate-making process, the waste solution in the plate-making process is heated by a heating means in an evaporation pot that is provided with base resistance and the water vapor separated from the waste solution in the plate-making process is taken out of the evaporation pot and condensed in a cooling means, thereby being turned into reclaimed water.
(FR)
L'invention concerne un procédé de traitement de solution résiduelle dans un processus de fabrication de plaques d'impression lithographique photosensibles, permettant d'obtenir d'excellentes performances d'entretien de l'équipement. Dans ce procédé, la solution résiduelle, qui est évacuée lorsque le processus de fabrication de plaque d'impression lithographique photosensible est réalisé au moyen d'un liquide révélateur se caractérisant en ce qu'il contient au moins un sucre sélectionné parmi des sucres non réducteurs et au moins une base, sans silicate, et en ce qu'il présente un pH compris entre 9 et 13,5, est évaporée et concentrée par un appareil de concentration par évaporation, ce qui sépare ladite solution en vapeur d'eau et en composant dissous. Puis, la solution résiduelle du processus de fabrication de plaques est chauffée par un moyen de chauffage dans un pot d'évaporation pourvu d'une résistance de base et la vapeur d'eau séparée de la solution résiduelle issue du processus de fabrication de plaques est extraite du pot d'évaporation, condensée dans un moyen de refroidissement et transformée ainsi en eau de récupération.
(JA)
 設備のメンテナンス性に優れた感光性平版印刷版の製版処理廃液の処理方法を提供する。非還元糖から選ばれる少なくとも一種の糖類と、少なくとも一種の塩基と、を含有し、珪酸塩を含まず、pHが9.0~13.5の範囲であることを特徴とする感光性平版印刷版用現像液を用いて感光性平版印刷版の製版処理を行った際に排出される製版処理廃液を、蒸発濃縮装置で蒸発濃縮し水蒸気と溶解成分とに分離する製版処理廃液の処理方法であって、前記製版処理廃液は耐塩基性を備えた蒸発釜中で加熱手段により加熱され、前記製版処理廃液より分離された前記水蒸気は前記蒸発釜より導出され冷却手段中で凝縮され再生水とされる。
Latest bibliographic data on file with the International Bureau