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1. WO2011028246 - ACTIVE SPECTRAL CONTROL OF OPTICAL SOURCE

Publication Number WO/2011/028246
Publication Date 10.03.2011
International Application No. PCT/US2010/002320
International Filing Date 24.08.2010
IPC
H01S 3/13 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
3Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
13Stabilisation of laser output parameters, e.g. frequency, amplitude
CPC
G03F 7/70525
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70483Information management, control, testing, and wafer monitoring, e.g. pattern monitoring
70491Information management and control, including software
70525Controlling normal operating mode, e.g. matching different apparatus, remote control, prediction of failure
G03F 7/70575
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70483Information management, control, testing, and wafer monitoring, e.g. pattern monitoring
7055Exposure light control, in all parts of the microlithographic apparatus, e.g. pulse length control, light interruption
70575Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength, matching of optical components to wavelength
Applicants
  • CYMER, INC. [US]/[US] (AllExceptUS)
  • SEONG, Nakgeuon [KR]/[US] (UsOnly)
  • LALOVIC, Ivan, B. [US]/[US] (UsOnly)
  • FARRAR, Nigel, R. [GB]/[US] (UsOnly)
  • RAFAC, Robert, J. [US]/[US] (UsOnly)
  • BENDIK, Joseph, J. [US]/[US] (UsOnly)
Inventors
  • SEONG, Nakgeuon
  • LALOVIC, Ivan, B.
  • FARRAR, Nigel, R.
  • RAFAC, Robert, J.
  • BENDIK, Joseph, J.
Agents
  • BROOKS, Jeffrey, J.
Priority Data
12/860,28820.08.2010US
61/236,84825.08.2009US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) ACTIVE SPECTRAL CONTROL OF OPTICAL SOURCE
(FR) COMMANDE SPECTRALE ACTIVE D'UNE SOURCE OPTIQUE
Abstract
(EN)
A method of controlling a spectral property of a light beam includes directing a light beam to a lithography exposure apparatus configured to create a pattern on a wafer; receiving information representative of a spectral property of the light beam; receiving information representative of an optical imaging condition of the lithography exposure apparatus; estimating a characteristic value of the light beam based on the received spectral property information and the received optical imaging condition information; determining whether the estimated light beam characteristic value matches a target light beam characteristic value; and if it is determined that the estimated light beam characteristic value does not match the target light beam characteristic value, adjusting the spectral property of the light beam.
(FR)
L'invention concerne un procédé de commande d'une propriété spectrale d'un faisceau lumineux comprenant les étapes consistant à: adresser un faisceau lumineux vers un appareil d'exposition lithographique configuré de façon à créer un motif sur une tranche, recevoir une information représentant une propriété spectrale du faisceau lumineux, recevoir une information représentant un état d'imagerie optique de l'appareil d'exposition lithographique, estimer une valeur caractéristique du faisceau lumineux sur la base de l'information reçue sur la propriété spectrale et de l'information reçue sur l'état d'imagerie optique, déterminer si la valeur caractéristique déterminée pour le faisceau lumineux correspond à une valeur cible caractéristique du faisceau lumineux, et s'il est déterminé que la valeur caractéristique estimée du faisceau lumineux ne correspond pas à la valeur cible caractéristique du faisceau lumineux, régler la propriété spectrale du faisceau lumineux.
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