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1. (WO2011021874) NOVEL CHIL-HWANG MUSHROOM AND A METHOD FOR CULTURING THE SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2011/021874    International Application No.:    PCT/KR2010/005513
Publication Date: 24.02.2011 International Filing Date: 20.08.2010
IPC:
A01G 1/04 (2006.01)
Applicants: LEE, Soung Ho [KR/KR]; (KR).
KOO, Tae Hee [KR/KR]; (KR) (For US Only)
Inventors: LEE, Soung Ho; (KR).
KOO, Tae Hee; (KR)
Priority Data:
10-2009-0077467 21.08.2009 KR
Title (EN) NOVEL CHIL-HWANG MUSHROOM AND A METHOD FOR CULTURING THE SAME
(FR) NOUVEAU CHAMPIGNON CHIL-HWANG ET SON PROCÉDÉ DE CULTURE
(KO) 신규한 칠황버섯 및 이를 배양하는 방법
Abstract: front page image
(EN)Disclosed is a novel chil-hwang mushroom cultivated from the Japanese lacquer tree (Toxicodendron vernicifluum) from which the toxicity has been removed. Lacquer is harmless to the human body, has a high level of antimicrobial activity and a high-level decay-preventing effect and an effect whereby it suppresses mould, and such effects have also been exhibited in chil-hwang mushrooms grown using a culture medium consisting of the Japanese lacquer tree. Further, chil-hwang mushrooms have been confirmed to have a neutralizing effect on agrichemicals, herbicides and the like which have been used in the cultivation of cereals. There have been attempts to culture chil-hwang mushrooms on oak trees and Populus deltoides, which are not the Japanese lacquer tree, and also to culture chil-hwang mushrooms using Japanese lacquer trees from which the toxicity has not been removed, but the chil-hwang mushroom does not grow under such conditions, from which it has been possible to demonstrate that the chil-hwang mushroom can grow only on Japanese lacquer trees from which the toxicity has been removed.
(FR)L'invention porte sur un nouveau champignon Chil-hwang cultivé à partir de Vernis du Japon (Toxicodendron vernicifluum) dont la toxicité a été enlevée. Le Vernis est sans danger pour le corps humain, a un niveau élevé d'activité antimicrobienne et un effet de prévention de la pourriture de haut niveau et un effet par lequel il supprime la moisissure, et de tels effets ont également été présentés par des champignons Chil-hwang qu'on a fait pousser à l'aide d'un milieu de culture constitué du Vernis du Japon. En outre, il a été confirmé que les champignons Chil-hwang ont un effet de neutralisation sur des produits agrochimiques, des herbicides et similaires qui ont été utilisés dans la culture de céréales. Il y a eu des tentatives de culture de champignons Chil-hwang sur des chênes et Populus deltoides, qui ne sont pas le Vernis du Japon, et également de culture de champignons Chil-hwang utilisant des Vernis du Japon dont la toxicité n'avait pas été enlevée, mais le champignon Chil-hwang ne pousse pas dans de telles conditions, à partir de quoi il a été possible de démontrer que le champignon Chil-hwang ne peut pousser que sur des Vernis du Japon dont la toxicité a été enlevée.
(KO)본 발명에서는 독성이 제거된 옻나무로부터 배양된 신규한 칠황버섯이 개시된다. 옻은 인체에 무해하고 항균력이 높고 방부 효과가 높으며 곰팡이를 억제하는 효과가 있는데 이러한 효과가 옻나무를 배지로 하여 자라는 칠황버섯에도 나타났다. 또한 곡식을 재배할 때 사용되었던 농약이나 제초제 등이 중화되는 효과가 칠황버섯에 있는 것을 확인하였다. 옻나무가 아닌 참나무나 미루나무에서 칠황버섯을 배양하는 것이나 독성을 제거하지 않은 옻나무를 이용하여 칠황버섯을 배양하는 것을 시도하였으나 상기 조건에서는 칠황버섯이 자라지 않아 이로써 칠황버섯은 독성을 제거한 옻나무에서만 자랄 수 있다는 것을 입증할 수 있었다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)