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Machine translation
1. (WO2011021824) ELECTROSTATIC CHUCK AND METHOD FOR MANUFACTURING SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2011/021824    International Application No.:    PCT/KR2010/005408
Publication Date: 24.02.2011 International Filing Date: 17.08.2010
IPC:
H01L 21/687 (2006.01)
Applicants: KOMICO LTD. [KR/KR]; 79 Sinmosan-dong, Anseong-si Gyeonggi-do 456-390 (KR) (For All Designated States Except US).
SUNG, Jin-Il [KR/KR]; (KR) (For US Only).
YE, Kyung-Hwan [KR/KR]; (KR) (For US Only).
OH, Chi-Won [KR/KR]; (KR) (For US Only).
YU, Chung-Ryoul [KR/KR]; (KR) (For US Only)
Inventors: SUNG, Jin-Il; (KR).
YE, Kyung-Hwan; (KR).
OH, Chi-Won; (KR).
YU, Chung-Ryoul; (KR)
Agent: PARK, Young-Woo; 5F., Seil Building 727-13 Yeoksam-dong, Gangnam-gu Seoul 135-921 (KR)
Priority Data:
10-2009-0077369 21.08.2009 KR
Title (EN) ELECTROSTATIC CHUCK AND METHOD FOR MANUFACTURING SAME
(FR) DISPOSITIF DE SERRAGE ÉLECTROSTATIQUE ET PROCÉDÉ DE FABRICATION DUDIT DISPOSITIF
(KO) 정전척 및 이의 제조 방법
Abstract: front page image
(EN)The invention relates to an electrostatic chuck, comprising: a base; an amorphous first insulating layer formed on the base; an electrode layer for generating electrostatic force formed on the first insulating layer; and a dielectric layer formed on the electrode layer. Accordingly, the electrostatic chuck of the present invention suppresses arcing caused by the leakage of current, and achieves improved electrical characteristics and durability.
(FR)L'invention concerne un dispositif de serrage électrostatique comprenant : une base ; une première couche isolante amorphe formée sur la base ; une couche d'électrodes générant la force électrostatique, formée sur la première couche isolante ; et une couche diélectrique formée sur la couche d'électrodes. En conséquence, le dispositif de serrage électromagnétique selon l'invention supprime la formation d'arcs due à la fuite de courant et permet d'améliorer les caractéristiques électriques et la durabilité.
(KO)정전척은 베이스 기재와, 베이스 기재 상에 형성된 비정질의 제1 절연층과, 제1 절연층 상에 형성된 정전기력 발생용 전극층과, 전극층 상에 형성된 유전층을 포함한다. 따라서, 정전척은 누설 전류에 의한 아킹 발생을 억제하고 전기적 특성 및 내구성이 향상된다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)