WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2011021609) TIO2-CONTAINING SILICA GLASS, AND OPTICAL MEMBER FOR EUV LITHOGRAPHY
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2011/021609    International Application No.:    PCT/JP2010/063834
Publication Date: 24.02.2011 International Filing Date: 16.08.2010
IPC:
C03C 3/06 (2006.01), H01L 21/027 (2006.01)
Applicants: Asahi Glass Company, Limited. [JP/JP]; 5-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo 1008405 (JP) (For All Designated States Except US).
KOIKE Akio [JP/JP]; (JP) (For US Only).
IWAHASHI Yasutomi [JP/JP]; (JP) (For US Only).
KIKUGAWA Shinya [JP/JP]; (JP) (For US Only)
Inventors: KOIKE Akio; (JP).
IWAHASHI Yasutomi; (JP).
KIKUGAWA Shinya; (JP)
Agent: OGURI Shohei; Eikoh Patent Firm, Toranomon East Bldg. 10F, 7-13, Nishi-Shimbashi 1-chome, Minato-ku, Tokyo 1050003 (JP)
Priority Data:
2009-189899 19.08.2009 JP
Title (EN) TIO2-CONTAINING SILICA GLASS, AND OPTICAL MEMBER FOR EUV LITHOGRAPHY
(FR) VERRE DE SILICE À TENEUR EN TIO2 ET ÉLÉMENT OPTIQUE POUR UNE LITHOGRAPHIE EN EXTRÊME UV
(JA) TiO2を含有するシリカガラスおよびEUVリソグラフィ用光学部材
Abstract: front page image
(EN)A TiO2-containing silica glass having a TiO2 content of 7.5 to 12 mass% and a fictive temperature of 1000˚C or higher, wherein the temperature at which the linear thermal expansion coefficient of the silica glass becomes 0 ppb/°C falls within the range from 40 to 110°C.
(FR)L'invention porte sur un verre de silice à teneur en TiO2 ayant une teneur en TiO2 de 7,5 à 12% en masse et une température fictive de 1000˚C ou plus, la température à laquelle le coefficient de dilatation thermique linéaire du verre de silice devient de 0 ppb/°C tombant à l'intérieur de la plage de 40 à 110°C.
(JA) 本発明は、TiO2含有量が7.5~12質量%であり、仮想温度が1000℃以上であり、線熱膨張係数が0ppb/℃となる温度が40~110℃の範囲にある、TiO2を含有するシリカガラスに関する。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)