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Machine translation
1. (WO2011020968) STRAIN GAUGE, AND SYSTEM FOR SPATIALLY LOCATING SUCH GAUGES
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2011/020968    International Application No.:    PCT/FR2010/051708
Publication Date: 24.02.2011 International Filing Date: 12.08.2010
IPC:
G01B 7/16 (2006.01), G01M 5/00 (2006.01), G01S 17/06 (2006.01), G01B 11/02 (2006.01), G06T 7/00 (2006.01), G01B 5/30 (2006.01), G01B 11/16 (2006.01), G01L 1/22 (2006.01)
Applicants: EUROPEAN AERONAUTIC DEFENCE AND SPACE COMPANY EADS FRANCE [FR/FR]; 37, Boulevard de Montmorency F-75016 Paris (FR) (For All Designated States Except US).
SWIERGIEL, Nicolas [FR/FR]; (FR) (For US Only).
BOSQUET, Catherine [FR/FR]; (FR) (For US Only).
DIDIERJEAN, Sébastien [FR/FR]; (FR) (For US Only)
Inventors: SWIERGIEL, Nicolas; (FR).
BOSQUET, Catherine; (FR).
DIDIERJEAN, Sébastien; (FR)
Agent: COQUEL, Jean-Marc; SCHMIT-CHRETIEN-SCHIHIN 111, Cours du Médoc CS40 009 F-33070 Bordeaux Cedex (FR)
Priority Data:
0955694 17.08.2009 FR
Title (EN) STRAIN GAUGE, AND SYSTEM FOR SPATIALLY LOCATING SUCH GAUGES
(FR) JAUGE DE DÉFORMATION ET SYSTÈME DE LOCALISATION SPATIALE DE TELLES JAUGES
Abstract: front page image
(EN)The invention relates to a strain gauge including a substrate (2) for mounting an element (3) to be reversibly lengthened by means of a force applied while displaying a variation in the resistance thereof, said element (3) lengthening itself along an axis for measurement by said gauge. According to the invention, said gauge includes at least one contrast target (5, 6) capable of reflecting an incident light beam, said at least one contrast target (5, 6) being placed on said gauge in a predetermined position that makes it possible to predetermine the center of the axis (4), for measurement by said strain gauge (1), by detecting the position of said at least one contrast target (5, 6).
(FR)L'invention concerne une jauge de déformation comprenant un substrat (2) support d'un élément (3) destiné à s'allonger réversiblement sous l'action d'un effort appliqué en exhibant une variation de sa résistance, ledit élément (3) s'allongeant le long d'un axe de mesure de ladite jauge. Selon l'invention, cette jauge comprend au moins une cible de contraste (5, 6) apte à réfléchir un faisceau lumineux incident, ladite au moins une cible de contraste (5, 6) étant placée sur ladite jauge dans une position prédéterminée permettant la détermination du centre et de l'axe de mesure (4) de ladite jauge de déformation (1) par la détection de la position de ladite au moins une cible de contraste (5, 6).
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: French (FR)
Filing Language: French (FR)