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Machine translation
1. (WO2011020690) METHOD FOR PRODUCING A MIRROR HAVING AT LEAST TWO MIRROR SURFACES, MIRROR OF A PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY, AND PROJECTION EXPOSURE APPARATUS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2011/020690    International Application No.:    PCT/EP2010/061148
Publication Date: 24.02.2011 International Filing Date: 30.07.2010
IPC:
G02B 13/14 (2006.01), G02B 17/06 (2006.01), G03F 7/20 (2006.01)
Applicants: CARL ZEISS SMT GMBH [DE/DE]; Rudolf-Eber-Strasse 2 73447 Oberkochen (DE) (For All Designated States Except US).
HETZLER, Jochen [DE/DE]; (DE) (For US Only).
MUELLER, Ralf [DE/DE]; (DE) (For US Only).
SINGER, Wolfgang [DE/DE]; (DE) (For US Only)
Inventors: HETZLER, Jochen; (DE).
MUELLER, Ralf; (DE).
SINGER, Wolfgang; (DE)
Agent: CARL ZEISS AG; Carl-Zeiss-Strasse 22 73447 Oberkochen (DE)
Priority Data:
102009036484.6 07.08.2009 DE
Title (EN) METHOD FOR PRODUCING A MIRROR HAVING AT LEAST TWO MIRROR SURFACES, MIRROR OF A PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY, AND PROJECTION EXPOSURE APPARATUS
(FR) PROCÉDÉ POUR PRODUIRE UN MIROIR AYANT AU MOINS DEUX SURFACES DE MIROIR, MIROIR D'UN APPAREIL D'EXPOSITION PAR PROJECTION POUR MICROLITHOGRAPHIE ET APPAREIL D'EXPOSITION PAR PROJECTION
Abstract: front page image
(EN)The invention relates to a mirror (M) of a projection exposure apparatus for rnicrolithography for the structured exposure of a light-sensitive material and to a method for producing a mirror (M), The mirror (M) according to the Invention has a substrate body (B), a first mirror surface (S) and a second mirror surface (S5). The first mirror surface (S) is formed on a first side (VS) of the substrate body (3). The second mirror surface (S') is formed on a second side (RS) of the substrate body (B), said second side being different from the first side of the substrate body (B). The mirror (M) according to the invention can be embodied, in particular, such that the substrate body (B) is produced from a glass ceramic material.
(FR)L'invention concerne un miroir (M) d'un appareil d'exposition par projection pour microlithographie pour l'exposition structurée d'un matériau photosensible et un procédé pour produire un miroir (M). Le miroir (M) selon l'invention a un corps de substrat (B), une première surface de miroir (S) et une seconde surface de miroir (S5). La première surface de miroir (S) est formée sur un premier côté (VS) du corps de substrat (3). La seconde surface de miroir (S') est formée sur un second côté (RS) du corps de substrat (B), ledit second côté étant différent du premier côté du corps substrat (B). Le miroir (M) selon l'invention peut être incorporé, en particulier, de telle sorte que le corps de substrat (B) est produit à partir d'un matériau vitrocéramique.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)