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Machine translation
1. (WO2011019279) A METHOD OF FABRICATING AN IMPRINTED SUBSTRATE HAVING REGIONS WITH MODIFIED WETTABILITY
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2011/019279    International Application No.:    PCT/NL2010/050509
Publication Date: 17.02.2011 International Filing Date: 13.08.2010
IPC:
G03F 7/00 (2006.01)
Applicants: NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNO [NL/NL]; Schoemakerstraat 97 NL-2628 VK Delft (NL) (For All Designated States Except US).
IVAN, Marius, Gabriel [RO/NL]; (NL) (For US Only).
VERHAART, Gerardus, Johannes [NL/NL]; (NL) (For US Only).
PETER, Maria [NL/NL]; (NL) (For US Only).
MEINDERS, Erwin, Rinaldo [NL/NL]; (NL) (For US Only)
Inventors: IVAN, Marius, Gabriel; (NL).
VERHAART, Gerardus, Johannes; (NL).
PETER, Maria; (NL).
MEINDERS, Erwin, Rinaldo; (NL)
Agent: JANSEN, C.M.; Vereenigde Johan de Wittlaan 7 NL-2517 JR Den Haag (NL)
Priority Data:
09167930.8 14.08.2009 EP
Title (EN) A METHOD OF FABRICATING AN IMPRINTED SUBSTRATE HAVING REGIONS WITH MODIFIED WETTABILITY
(FR) PROCÉDÉ DE FABRICATION D'UN SUBSTRAT IMPRIMÉ PRÉSENTANT DES RÉGIONS À MOUILLABILITÉ MODIFIÉE
Abstract: front page image
(EN)The invention relates to a method of fabrication of a substrate having a first region with a first wettability degree and a second region with a second wettability degree, the method comprising the steps of: providing the substrate (2) with a roughened surface of a photosensitive layer (4) using embedded nano- and/or microparticles (6); transferring (7) a pattern into the photosensitive layer for obtaining a substrate structure; developing the substrate structure (B) for obtaining the first region corresponding to the substrate (5a) and the second region (5b) corresponding to the roughened photosensitive layer.
(FR)L'invention concerne un procédé de fabrication d'un substrat possédant une première région ayant un premier degré de mouillabilité et une seconde région ayant un second degré de mouillabilité, le procédé comprenant les étapes consistant à : former sur le substrat (2) une surface rugueuse composée d'une couche photosensible (4) au moyen de nano- et/ou microparticules enrobées (6) ; transférer (7) un motif dans la couche photosensible pour obtenir une structure de substrat ; développer la structure de substrat (B) pour obtenir la première région correspondant au substrat (5a) et la seconde région (5b) correspondant à la couche photosensible rugueuse.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)