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Machine translation
1. (WO2011019039) SUBSTRATE HAVING TRANSPARENT CONDUCTIVE FILM ATTACHED THERETO, AND SUBSTRATE FOR PLASMA DISPLAY PANEL
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2011/019039    International Application No.:    PCT/JP2010/063575
Publication Date: 17.02.2011 International Filing Date: 10.08.2010
IPC:
H01J 17/49 (2012.01), C03C 17/245 (2006.01), C23C 14/08 (2006.01), H01B 13/00 (2006.01), H01B 5/14 (2006.01), H01J 17/04 (2012.01), H01J 17/16 (2012.01)
Applicants: Asahi Glass Company, Limited. [JP/JP]; 5-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo 1008405 (JP) (For All Designated States Except US).
OKATO Takeshi [JP/JP]; (JP) (For US Only).
ODAKA Hidefumi [JP/JP]; (JP) (For US Only)
Inventors: OKATO Takeshi; (JP).
ODAKA Hidefumi; (JP)
Agent: OGURI Shohei; Eikoh Patent Firm, Toranomon East Bldg. 10F, 7-13, Nishi-Shimbashi 1-chome, Minato-ku, Tokyo 1050003 (JP)
Priority Data:
2009-187960 14.08.2009 JP
Title (EN) SUBSTRATE HAVING TRANSPARENT CONDUCTIVE FILM ATTACHED THERETO, AND SUBSTRATE FOR PLASMA DISPLAY PANEL
(FR) SUBSTRAT À COUCHE MINCE CONDUCTRICE TRANSPARENTE FIXÉE AUDIT SUBSTRAT ET SUBSTRAT POUR ÉCRAN PLASMA
(JA) 透明導電膜付基板およびプラズマディスプレイパネル用基板
Abstract: front page image
(EN)A substrate having a transparent conductive film attached thereto, comprising a transparent glass substrate and a transparent conductive film mainly composed of tin oxide (SnO2) and formed on the transparent glass substrate, wherein the peak intensity ratio (Y/X) is 1.5 to 1.8 inclusive (wherein Y represents the crystalline peak of SnO2 face(100) contained in the XRD peaks of the transparent conductive film; and X represents the background peak caused by the glass transparent substrate).
(FR)L'invention concerne un substrat à couche mince conductrice transparente fixée audit substrat, comprenant un substrat en verre transparent et une couche mince conductrice transparente composée essentiellement d'oxyde d'étain (SnO2), et formée sur le substrat en verre transparent, le rapport d'intensité de pic (Y/X) étant de 1,5 à 1,8 inclus (Y représentant le pic cristallin d'une face SnO2 (100) contenu dans les pics XRD de la couche mince transparente; et X représentant un pic de fond provoqué par le substrat en verre transparent).
(JA) 本発明は、ガラス透明基板上に、酸化スズ(SnO)を主成分とする透明導電膜が形成された透明導電膜付基板であって、前記透明導電膜のXRDピークにおけるSnO(100)面の結晶ピークをYとし、ガラス透明基板によるバックグラウンドピークをXとするとき、ピーク強度比Y/Xが1.5以上1.8以下となることを特徴とする透明導電膜付基板に関する。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)