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1. (WO2011012144) COMPONENT OF AN EUV OR UV LITHOGRAPHY APPARATUS AND METHOD FOR PRODUCING IT
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2011/012144    International Application No.:    PCT/EP2009/005513
Publication Date: 03.02.2011 International Filing Date: 30.07.2009
IPC:
G03F 7/20 (2006.01), B29D 11/00 (2006.01), G02B 7/00 (2006.01)
Applicants: CARL ZEISS SMT GMBH [DE/DE]; Rudolf-Eber-Strasse 2 73447 Oberkochen (DE) (For All Designated States Except US).
CHUNG, Hin Yiu Anthony [DE/DE]; (DE) (For US Only)
Inventors: CHUNG, Hin Yiu Anthony; (DE)
Agent: Carl Zeiss AG; Patentabteilung Carl-Zeiss-Strasse 22 73447 Oberkochen (DE)
Priority Data:
Title (EN) COMPONENT OF AN EUV OR UV LITHOGRAPHY APPARATUS AND METHOD FOR PRODUCING IT
(FR) COMPOSANT D'UN APPAREIL DE LITHOGRAPHIE PAR EUV OU UV ET PROCÉDÉ POUR SA PRODUCTION
Abstract: front page image
(EN)To improve the bonding of two parts (401, 403) of a component (400) of an EUV or UV lithography apparatus such that the probability of occurrence of additional stress over time in the bonded parts (401, 403) is lessened, a component (400) of an EUV or UV lithography apparatus comprising two parts (401, 403) bonded to each other by adhesive material (405) is proposed, wherein the adhesive material (405) is coated with a protective layer (407) insulating the adhesive material (405) from the surrounding gas environment.
(FR)Pour améliorer la liaison de deux parties (401, 403) d'un composant (400) d'un appareil de lithographie par EUV ou UV de manière à réduire la probabilité qu'une contrainte supplémentaire survienne au cours du temps dans les parties (401, 403) liées, l'invention propose un composant (400) d'un appareil de lithographie par EUV ou UV qui comprend deux parties (401, 403) liées l'une à l'autre par un matériau adhésif (405), le matériau adhésif (405) étant revêtu d'une couche protectrice (407) qui isole le matériau adhésif (405) de l'environnement gazeux ambiant.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)