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1. WO2011010879 - METHOD FOR FABRICATING AN ARRAY SUBSTRATE FOR A LIQUID CRYSTAL DISPLAY DEVICE

Publication Number WO/2011/010879
Publication Date 27.01.2011
International Application No. PCT/KR2010/004815
International Filing Date 22.07.2010
IPC
G02F 1/136 2006.01
GPHYSICS
02OPTICS
FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01for the control of the intensity, phase, polarisation or colour
13based on liquid crystals, e.g. single liquid crystal display cells
133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
CPC
C23F 1/18
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE
1Etching metallic material by chemical means
10Etching compositions
14Aqueous compositions
16Acidic compositions
18for etching copper or alloys thereof
G02F 2001/136295
GPHYSICS
02OPTICS
FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics
01for the control of the intensity, phase, polarisation or colour 
13based on liquid crystals, e.g. single liquid crystal display cells
133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
1362Active matrix addressed cells
136286Wiring, e.g. gate line, drain line
136295Materials; Compositions; Methods of manufacturing
Applicants
  • 동우 화인켐 주식회사 DONGWOO FINE-CHEM CO., LTD. [KR]/[KR] (AllExceptUS)
  • 최용석 CHOI, Yong-Suk [KR]/[KR] (UsOnly)
  • 이석 LEE, Suk [KR]/[KR] (UsOnly)
  • 윤영진 YOON, Young-Jin [KR]/[KR] (UsOnly)
  • 이현규 LEE, Hyun-Kyu [KR]/[KR] (UsOnly)
  • 이우람 LEE, Woo-Ram [KR]/[KR] (UsOnly)
Inventors
  • 최용석 CHOI, Yong-Suk
  • 이석 LEE, Suk
  • 윤영진 YOON, Young-Jin
  • 이현규 LEE, Hyun-Kyu
  • 이우람 LEE, Woo-Ram
Agents
  • 한양특허법인 HANYANG PATENT FIRM
Priority Data
10-2009-006753023.07.2009KR
10-2009-006753123.07.2009KR
Publication Language Korean (KO)
Filing Language Korean (KO)
Designated States
Title
(EN) METHOD FOR FABRICATING AN ARRAY SUBSTRATE FOR A LIQUID CRYSTAL DISPLAY DEVICE
(FR) PROCÉDÉ DE FABRICATION D'UN SUBSTRAT DE RÉSEAU DESTINÉ À UN DISPOSITIF D'AFFICHAGE À CRISTAUX LIQUIDES
(KO) 액정표시장치용 어레이 기판의 제조방법
Abstract
(EN)
The present invention relates to a method for fabricating an array substrate for a liquid crystal display device, using an etchant composition for a copper-based metal film, wherein the etchant composition comprises, based on the total weight of the etchant composition: a) 2 to 30 wt % of hydrogen peroxide (H2O2); b) 0.1 to 5 wt % of nitric acid (HNO3); c) 0.01 to 1.0 wt % of a fluorine compound; d) 0.1 to 5 wt % of an azole compound; e) 0.1 to 8.0 wt % of an imidazole compound; and f) the remainder being water.
(FR)
La présente invention a pour objet un procédé de fabrication d'un substrat de réseau destiné à un dispositif d'affichage à cristaux liquides, utilisant une composition de gravure pour film métallique à base de cuivre, la composition de gravure comprenant, sur la base du poids total de la composition de gravure : a) de 2 à 30 % en poids de peroxyde d'hydrogène (H2O2) ; b) de 0,1 à 5 % en poids d'acide nitrique (HNO3) ; c) de 0,01 à 1,0 % en poids d'un composé du fluor ; d) de 0,1 à 5 % en poids d'un composé azole ; e) de 0,1 à 8,0 % en poids d'un composé imidazole ; et f) le reste étant de l'eau.
(KO)
본 발명은 조성물의 총 중량에 대해 a) 과산화수소(H2O2) 2 내지 30 중량%; b) 질산(HNO3) 0.1 내지 5 중량%; c) 함불소 화합물 0.01 내지 1.0 중량%; d) 아졸류 화합물 0.1 내지 5 중량%; e) 이미다졸류 화합물 0.1 내지 8.0 중량%; 및 f) 물 잔량을 포함하는 것을 특징으로 하는 구리계 금속막의 식각액 조성물을 이용하는 액정표시장치용 어레이 기판의 제조방법에 관한 것입니다.
Also published as
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