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1. WO2011009971 - BIMETALLIC MAGNETIC WIRES WITH HELICAL ANISOTROPY, METHOD FOR MANUFACTURING SAME, AND USES THEREOF

Publication Number WO/2011/009971
Publication Date 27.01.2011
International Application No. PCT/ES2009/070417
International Filing Date 02.10.2009
IPC
G01R 33/05 2006.01
GPHYSICS
01MEASURING; TESTING
RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
33Arrangements or instruments for measuring magnetic variables
02Measuring direction or magnitude of magnetic fields or magnetic flux
04using the flux-gate principle
05in thin-film element
C23C 28/00 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
28Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups C23C2/-C23C26/173
CPC
C23C 28/00
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
28Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
C23C 28/02
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
28Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
02only coatings ; only including layers; of metallic material
C25D 5/006
CCHEMISTRY; METALLURGY
25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING
5Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
006Electroplating with applied electromagnetic field, not locally, e.g. for plating magnetic layers
C25D 7/0607
CCHEMISTRY; METALLURGY
25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING
7Electroplating characterised by the article coated
06Wires; Strips; Foils
0607Wires
G01R 33/05
GPHYSICS
01MEASURING; TESTING
RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
33Arrangements or instruments for measuring magnetic variables
02Measuring direction or magnitude of magnetic fields or magnetic flux
04using the flux-gate principle
05in thin-film element
Applicants
  • CONSEJO SUPERIOR DE INVESTIGACIONES CIENTÍFICAS (CSIC) [ES]/[ES] (AllExceptUS)
  • UNIVERSIDAD TÉCNICA CHECA [CZ]/[CZ] (AllExceptUS)
  • VÁZQUEZ VILLALABEITIA, Manuel [ES]/[ES] (UsOnly)
  • BADINI CONFALONIERI, Giovanni [IT]/[ES] (UsOnly)
  • INFANTE FERNÁNDEZ, Germán [ES]/[ES] (UsOnly)
  • BUTTA, Mattia [IT]/[CZ] (UsOnly)
  • RIPKA, Pavel [CZ]/[CZ] (UsOnly)
Inventors
  • VÁZQUEZ VILLALABEITIA, Manuel
  • BADINI CONFALONIERI, Giovanni
  • INFANTE FERNÁNDEZ, Germán
  • BUTTA, Mattia
  • RIPKA, Pavel
Agents
  • PONS ARIÑO, Ángel
Priority Data
P20093048320.07.2009ES
Publication Language Spanish (ES)
Filing Language Spanish (ES)
Designated States
Title
(EN) BIMETALLIC MAGNETIC WIRES WITH HELICAL ANISOTROPY, METHOD FOR MANUFACTURING SAME, AND USES THEREOF
(ES) HILOS MAGNÉTICOS BIMETÁLICOS CON ANISOTROPÍA HELICOIDAL, PROCESO DE FABRICACIÓN Y APLICACIONES
(FR) FILS MAGNÉTIQUES BIMÉTALLIQUES À ANISOTROPIE HÉLICOÏDALE, PROCÉDÉ DE FABRICATION ET APPLICATIONS
Abstract
(EN)
The present invention relates to a bimetallic magnetic wire which includes four separate layers, one of which is a ferromagnetic layer with helical anisotropy. Therefore, the invention relates to the field of magnetic materials, specifically to multilayer magnetic wires, and to the use thereof in the field of sensor elements, in particular the field of magnetic sensors.
(ES)
La presente invención se refiere un hilo magnético bimetálico que comprende cuatro capas diferentes, siendo una de ellas una capa ferromagnética con anisotropía helicoidal. Por tanto, Ia invención se encuentra enmarcada dentro del campo de materiales magnéticos, y concretamente de hilos magnéticos multicapas, y su aplicación dentro del campo de los elementos sensores, en particular el de los sensores magnéticos.
(FR)
La présente invention concerne un fil magnétique bimétallique comprenant quatre couches différentes, l'une d'elles étant une couche ferromagnétique à anisotropie hélicoïdale. Ainsi, l'invention relève du domaine des matériaux magnétiques, et plus particulièrement des fils magnétiques multicouches, et trouve une application dans le domaine des éléments capteurs, notamment des capteurs magnétiques.
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