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1. WO2011008436 - METHOD FOR REMOVING IMPLANTED PHOTO RESIST FROM HARD DISK DRIVE SUBSTRATES

Publication Number WO/2011/008436
Publication Date 20.01.2011
International Application No. PCT/US2010/039531
International Filing Date 22.06.2010
IPC
G11B 5/84 2006.01
GPHYSICS
11INFORMATION STORAGE
BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
5Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
84Processes or apparatus specially adapted for manufacturing record carriers
CPC
G03F 7/427
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26Processing photosensitive materials; Apparatus therefor
42Stripping or agents therefor
427using plasma means only
G11B 5/84
GPHYSICS
11INFORMATION STORAGE
BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
5Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
84Processes or apparatus specially adapted for manufacturing record carriers
Applicants
  • APPLIED MATERIALS, INC. [US]/[US] (AllExceptUS)
  • HILKENE, Martin A. [GB]/[US] (UsOnly)
  • FOAD, Majeed A. [GB]/[US] (UsOnly)
  • SCOTNEY-CASTLE, Matthew D. [GB]/[US] (UsOnly)
  • GOUK, Roman [UA]/[US] (UsOnly)
  • VERHAVERBEKE, Steven [BE]/[US] (UsOnly)
  • PORSHNEV, Peter [BY]/[US] (UsOnly)
Inventors
  • HILKENE, Martin A.
  • FOAD, Majeed A.
  • SCOTNEY-CASTLE, Matthew D.
  • GOUK, Roman
  • VERHAVERBEKE, Steven
  • PORSHNEV, Peter
Agents
  • PATTERSON, B. Todd
Priority Data
61/225,04613.07.2009US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) METHOD FOR REMOVING IMPLANTED PHOTO RESIST FROM HARD DISK DRIVE SUBSTRATES
(FR) PROCÉDÉ D'ÉLIMINATION DE RÉSINE PHOTOSENSIBLE IMPLANTÉE, À PARTIR DE SUBSTRATS D'UNITÉS DE DISQUE DUR
Abstract
(EN)
A method of removing resist material from a substrate having a magnetically active surface is provided. The substrate is disposed in a processing chamber and exposed to a fluorine-containing plasma formed from a gas mixture having a reagent, an oxidizing agent, and a reducing agent. A cleaning agent may also be included. The substrate may be cooled by back-side cooling or by a cooling process wherein a cooling medium is provided to the processing chamber while the plasma treatment is suspended. Substrates may be flipped over for two-sided processing, and multiple substrates may be processed concurrently.
(FR)
La présente invention se rapporte à un procédé d'élimination d'un matériau de résine photosensible à partir d'un substrat comprenant une surface magnétiquement active. Le substrat est placé dans une chambre de traitement et il est exposé à un plasma contenant du fluor constitué d'un mélange gazeux contenant un réactif, un agent oxydant et un agent réducteur. Le mélange peut également contenir un agent nettoyant. Le substrat peut être refroidi en exécutant un refroidissement sur le côté arrière ou en exécutant un processus de refroidissement dans lequel un milieu de refroidissement est injecté dans la chambre de traitement tandis que le traitement au plasma est suspendu. Pour un traitement double face, les substrats peuvent être retournés, et une pluralité de substrats peut être traitée en même temps.
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