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1. WO2011004787 - COPOLYMER FOR LITHOGRAPHY AND METHOD FOR EVALUATING SAME

Publication Number WO/2011/004787
Publication Date 13.01.2011
International Application No. PCT/JP2010/061382
International Filing Date 05.07.2010
IPC
G03F 7/26 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26Processing photosensitive materials; Apparatus therefor
C08F 220/10 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
220Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof
02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
10Esters
CPC
G03F 7/0392
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
039Macromolecular compounds which are photodegradable, e.g. positive electron resists
0392the macromolecular compound being present in a chemically amplified positive photoresist composition
G03F 7/0397
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
039Macromolecular compounds which are photodegradable, e.g. positive electron resists
0392the macromolecular compound being present in a chemically amplified positive photoresist composition
0397the macromolecular compound having an alicyclic moiety in a side chain
Applicants
  • 三菱レイヨン株式会社 Mitsubishi Rayon Co., Ltd. [JP]/[JP] (AllExceptUS)
  • 加藤 圭輔 KATOU Keisuke [JP]/[JP] (UsOnly)
  • 前田 晋一 MAEDA Shinichi [JP]/[JP] (UsOnly)
  • 松本 大祐 MATSUMOTO Daisuke [JP]/[JP] (UsOnly)
Inventors
  • 加藤 圭輔 KATOU Keisuke
  • 前田 晋一 MAEDA Shinichi
  • 松本 大祐 MATSUMOTO Daisuke
Agents
  • 志賀 正武 SHIGA Masatake
Priority Data
2009-16085707.07.2009JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) COPOLYMER FOR LITHOGRAPHY AND METHOD FOR EVALUATING SAME
(FR) COPOLYMÈRE POUR LITHOGRAPHIE ET PROCÉDÉ D'ÉVALUATION DE CELUI-CI
(JA) リソグラフィー用共重合体およびその評価方法
Abstract
(EN)
Disclosed is a method whereby the lithographic characteristics of a composition for lithography, which comprises a copolymer for lithography, can be evaluated without preparing the composition for lithography in practice. The lithographic characteristics of a composition for lithography, which comprises a copolymer for lithography, are evaluated by a method comprising: a step for dissolving said copolymer for lithography in a solvent to give a test solution; a step for separating gel matters from said test solution; and a step for determining a change rate of composition ratio indicating the rate of the difference, which is calculated by subtracting the composition ratio of a constitutional unit in said copolymer for lithography from the composition ratio of the constitutional unit in said gel matters, to the composition ratio of the constitutional unit in said copolymer for lithography, thereby evaluating the lithographic characteristics of the composition for lithography, which comprises said copolymer for lithography, based on the change rate of the composition ratio.
(FR)
L'invention porte sur un procédé grâce auquel les caractéristiques de lithographie d'une composition pour lithographie, qui comprend un copolymère pour lithographie, peuvent être évaluées sans préparer en pratique la composition pour lithographie. Les caractéristiques de lithographie d'une composition pour lithographie, qui comprend un polymère pour lithographie, sont évaluées par un procédé comprenant : une étape de dissolution de copolymère pour lithographie dans un solvant pour obtenir une solution de test ; une étape de séparation des matières de gel à partir de ladite solution de test ; et une étape de détermination d'un taux de changement du rapport de composition, indiquant le taux de la différence, qui est calculée par soustraction du rapport de composition d'une unité constitutive dans ledit copolymère pour lithographie, du rapport de composition de l'unité constitutive dans lesdites matières de gel, au rapport de composition de l'unité constitutive dans ledit copolymère pour lithographie, de manière à évaluer ainsi les caractéristiques de lithographie de la composition pour lithographie, qui comprend ledit copolymère pour lithographie, sur la base du taux de changement du rapport de composition.
(JA)
 リソグラフィー用共重合体を含むリソグラフィー用組成物のリソグラフィー特性を、実際にリソグラフィー用組成物を調製しなくても評価できる方法を提供する。リソグラフィー用共重合体を溶媒に溶解させて試験溶液を調製する工程と、前記試験溶液中のゲル状物を分離する工程と、前記リソグラフィー用共重合体における構成単位の組成比に対する、前記ゲル状物における構成単位の組成比から前記リソグラフィー用共重合体における構成単位の組成比を減じた差の割合を表わす組成比変化率求める工程と、前記組成比変化率により、前記リソグラフィー用共重合体を含むリソグラフィー用組成物のリソグラフィー特性を評価する。
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