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1. WO2011001969 - DEVICE FOR MANUFACTURING ALIGNED CARBON NANOTUBE ASSEMBLY

Publication Number WO/2011/001969
Publication Date 06.01.2011
International Application No. PCT/JP2010/061042
International Filing Date 29.06.2010
IPC
C01B 31/02 2006.01
CCHEMISTRY; METALLURGY
01INORGANIC CHEMISTRY
BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF
31Carbon; Compounds thereof
02Preparation of carbon; Purification
CPC
B01J 15/005
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
15Chemical processes in general for reacting gaseous media with non-particulate solids, e.g. sheet material; Apparatus specially adapted therefor
005in the presence of catalytically active bodies, e.g. porous plates
B01J 19/0006
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
19Chemical, physical or physico-chemical processes in general; Their relevant apparatus
0006Controlling or regulating processes
B01J 19/0073
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
19Chemical, physical or physico-chemical processes in general; Their relevant apparatus
0053Details of the reactor
0073Sealings
B01J 19/22
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
19Chemical, physical or physico-chemical processes in general; Their relevant apparatus
18Stationary reactors having moving elements inside
22in the form of endless belts
B01J 2219/00159
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
2219Chemical, physical or physico-chemical processes in general; Their relevant apparatus
00049Controlling or regulating processes
00051Controlling the temperature
00159controlling multiple zones along the direction of flow, e.g. pre-heating and after-cooling
B82Y 30/00
BPERFORMING OPERATIONS; TRANSPORTING
82NANOTECHNOLOGY
YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
30Nanotechnology for materials or surface science, e.g. nanocomposites
Applicants
  • 日本ゼオン株式会社 ZEON CORPORATION [JP]/[JP] (AllExceptUS)
  • 独立行政法人産業技術総合研究所 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY [JP]/[JP] (AllExceptUS)
  • 渋谷 明慶 SHIBUYA, Akiyoshi [JP]/[JP] (UsOnly)
  • 畠 賢治 HATA, Kenji [JP]/[JP] (UsOnly)
  • 湯村 守雄 YUMURA, Motoo [JP]/[JP] (UsOnly)
Inventors
  • 渋谷 明慶 SHIBUYA, Akiyoshi
  • 畠 賢治 HATA, Kenji
  • 湯村 守雄 YUMURA, Motoo
Agents
  • 特許業務法人原謙三国際特許事務所 HARAKENZO WORLD PATENT & TRADEMARK
Priority Data
2009-15722601.07.2009JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) DEVICE FOR MANUFACTURING ALIGNED CARBON NANOTUBE ASSEMBLY
(FR) DISPOSITIF DESTINÉ À LA FABRICATION D'UN ENSEMBLE DE NANOTUBES DE CARBONE ALIGNÉS
(JA) カーボンナノチューブ配向集合体の製造装置
Abstract
(EN)
Disclosed is a device (100) for manufacturing aligned carbon nanotube assemblies while continuously transferring substrates (10) that carry a catalyst thereon, the device being provided with a gas mixing preventing means (12, 13) for preventing the mixing of gas outside a growth furnace (3a) into gas inside the growth furnace (3a), the gas mixing preventing means (12, 13) being provided with a seal gas jetting part (12b, 13b) for jetting seal gas along open surfaces of openings, which the catalyst substrate is put into and taken out of, of the growth furnace (3a), and an exhaust part (12a, 13a) for sucking the seal gas such that the seal gas does not get into the growth furnace (3a) from the openings and discharging the seal gas to the outside of the manufacturing device. Thus, the device for continuously manufacturing the aligned CNT assemblies is provided, wherein the mixing of outside air is prevented, the concentration distribution and flow velocity distribution above the substrate of source gas and/or a catalyst activating substance are controlled uniformly within the range suitable for manufacturing CNTs, and the flow of gas in the growth furnace is not disturbed as much as possible.
(FR)
La présente invention a pour objet un dispositif (100) destiné à la fabrication d'ensembles de nanotubes de carbone alignés pendant le transfert en continu de substrats (10) qui portent un catalyseur, le dispositif étant pourvu d'un moyen de prévention du mélange des gaz (12, 13) permettant d'empêcher le mélange du gaz à l'extérieur d'un four de croissance (3a) dans le gaz à l'intérieur du four de croissance (3a), le moyen de prévention du mélange des gaz (12, 13) étant pourvu d'une partie injection de gaz d'étanchéité (12b, 13b) pour l'injection de gaz d'étanchéité le long des surfaces ouvertes des ouvertures, dans lesquelles le substrat de catalyseur est placé et desquelles il est retiré, du four de croissance (3a), et d'une partie échappement (12a, 13a) pour l'aspiration du gaz d'étanchéité de telle sorte que le gaz d'étanchéité n'entre pas dans le four de croissance (3a) par les ouvertures et l'évacuation du gaz d'étanchéité vers l'extérieur du dispositif de fabrication. Ainsi, la présente invention concerne le dispositif destiné à la fabrication en continu des ensembles de nanotubes de carbone alignés, le mélange de l'air extérieur étant empêché, la distribution de la concentration et la distribution de la vitesse d'écoulement au-dessus du substrat du gaz source et/ou d'une substance d'activation du catalyseur étant réglées de manière uniforme au sein de la gamme appropriée pour la fabrication de nanotubes de carbone, et l'écoulement du gaz dans le four de croissance étant perturbé le moins possible.
(JA)
 成長炉(3a)外のガスが成長炉(3a)内のガスに混入することを防止するガス混入防止手段(12、13)を備え、ガス混入防止手段(12、13)は、成長炉(3a)の触媒基板(10)を入れる口及び取り出す口の開口面に沿ってシールガスを噴射するシールガス噴射部(12b、13b)と、当該シールガスが当該口から成長炉(3a)の中に入らないように吸引して製造装置(100)の外部に排気する排気部(12a、13a)とを備えることにより、触媒を担持した基材を連続的に搬送しながらカーボンナノチューブ配向集合体を製造する装置において、外気混入を防止するとともに、原料ガス及び/又は触媒賦活物質の基材上における濃度分布、流速分布をCNTの製造に適した範囲内で均一に制御するとともに、成長炉内におけるガスの流れをできるだけ乱さないCNT配向集合体の連続製造装置を提供する。
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