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1. WO2011001611 - CHARGED PARTICLE GUN AND CHARGED PARTICLE BEAM DEVICE

Publication Number WO/2011/001611
Publication Date 06.01.2011
International Application No. PCT/JP2010/003892
International Filing Date 11.06.2010
IPC
H01J 37/18 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
18Vacuum locks
H01J 37/06 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
06Electron sources; Electron guns
CPC
H01J 2237/06316
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
06Sources
063Electron sources
06308Thermionic sources
06316Schottky emission
H01J 37/06
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
06Electron sources; Electron guns
H01J 37/1472
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
147Arrangements for directing or deflecting the discharge along a desired path
1472Deflecting along given lines
H01J 37/18
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
18Vacuum locks ; ; Means for obtaining or maintaining the desired pressure within the vessel
Applicants
  • 株式会社 日立ハイテクノロジーズ HITACHI HIGH-TECHNOLOGIES CORPORATION [JP]/[JP] (AllExceptUS)
  • 趙福来 CHO, Boklae [KR]/[JP] (UsOnly)
  • 小久保滋 KOKUBO, Shigeru [JP]/[JP] (UsOnly)
  • 村越久弥 MURAKOSHI, Hisaya [JP]/[JP] (UsOnly)
Inventors
  • 趙福来 CHO, Boklae
  • 小久保滋 KOKUBO, Shigeru
  • 村越久弥 MURAKOSHI, Hisaya
Agents
  • 井上学 INOUE, Manabu
Priority Data
2009-15453230.06.2009JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) CHARGED PARTICLE GUN AND CHARGED PARTICLE BEAM DEVICE
(FR) CANON À PARTICULES CHARGÉES ET DISPOSITIF À FAISCEAU DE PARTICULES CHARGÉES
(JA) 荷電粒子銃及び荷電粒子線装置
Abstract
(EN)
Disclosed is a charged particle gun which is provided with a charged particle source (1), an extraction electrode (2), and an opening (14) which a charged particle beam passes through. In a region wherein the charged particle source and the opening are connected, a barrier wall which prevents molecules present in a vacuum chamber in the downstream from being adsorbed to the charged particle source through the opening. Since the molecules present in the vacuum chamber at a lower vacuum degree in the downstream are prevented from being adsorbed to the charged particle source and current noise can be reduced, the charged particle gun and the charged particle beam device having the charged particle gun disposed therein are stably operated.
(FR)
L'invention porte sur un canon à particules chargées qui comprend une source de particules chargées (1), une électrode d'extraction (2) et une ouverture (14) par laquelle passe un faisceau de particules chargées. Dans une région dans laquelle la source de particules chargées et l'ouverture sont reliées, une paroi barrière empêche des molécules présentes dans une chambre à vide située en aval d'être adsorbées sur la source de particules chargées en passant par l'ouverture. Etant donné que les molécules présentes dans la chambre vide à un degré de vide inférieur en aval sont empêchées d'être adsorbées sur la source de particules chargées et un bruit de courant peut être réduit, le canon à particules chargées et le dispositif à faisceau de particules chargées dans lequel est placé le canon à particules chargées fonctionnent de façon stable.
(JA)
 本発明の荷電粒子銃は、荷電粒子源(1)と引出電極(2)と荷電粒子線が通過する開口(14)とを備え、前記荷電粒子源と前記開口を結ぶ領域に、下流側の真空室に存在する分子が前記開口を通って前記荷電粒子源に吸着することを防ぐための障壁を設けることを特徴としている。 これにより、真空度の低い下流側の真空室に存在する分子が荷電粒子源に吸着することを防ぎ、電流ノイズの低減を図ることができるようになるので、荷電粒子線銃及び当該荷電粒子線銃を設置した荷電粒子線装置を安定して稼動させることが可能になった。
Also published as
DE112010002767
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