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1. WO2011000211 - METHOD FOR PREPARING HIGH DENSITY SPUTTERING COATING TARGET BY NB-DOPED NANO INDIUM TIN OXIDE POWDER

Publication Number WO/2011/000211
Publication Date 06.01.2011
International Application No. PCT/CN2010/000936
International Filing Date 24.06.2010
IPC
C23C 14/34 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
34Sputtering
C23C 14/06 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06characterised by the coating material
CPC
C23C 14/086
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06characterised by the coating material
08Oxides
086of zinc, germanium, cadmium, indium, tin, thallium or bismuth
C23C 14/3414
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
34Sputtering
3407Cathode assembly for sputtering apparatus, e.g. Target
3414Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
Applicants
  • 北京航空航天大学 BEIHANG UNIVERSITY [CN]/[CN] (AllExceptUS)
  • 郑伟 ZHENG, Wei [CN]/[CN]
  • 张维佳 ZHANG, Weijia [CN]/[CN] (UsOnly)
Inventors
  • 郑伟 ZHENG, Wei
  • 张维佳 ZHANG, Weijia
Agents
  • 北京慧泉知识产权代理有限公司 HUIQUAN INTELLECTUAL PROPERTY LTD.
Priority Data
200910087558.729.06.2009CN
Publication Language Chinese (ZH)
Filing Language Chinese (ZH)
Designated States
Title
(EN) METHOD FOR PREPARING HIGH DENSITY SPUTTERING COATING TARGET BY NB-DOPED NANO INDIUM TIN OXIDE POWDER
(FR) PROCÉDÉ DE PRÉPARATION D'UNE CIBLE DE REVÊTEMENT PAR PULVÉRISATION DE DENSITÉ ÉLEVÉE PAR UNE NANOPOUDRE À BASE D'OXYDE D'INDIUM-ÉTAIN DOPÉE AU NIOBIUM (NB)
(ZH) 采用掺铌纳米铟锡氧化物粉末制备高密度溅射镀膜靶材的方法
Abstract
(EN)
A method for preparing high density sputtering coating target by Nb-doped nano indium tin oxide powder comprises the following steps: (1) dissolving high pure metals: high pure metal niobium, high pure metal indium and high pure metal tin are respectively dissolved into inorganic acid to form transparent solutions; (2) mixing: the obtained transparent solutions are respectively filled into containers according to the proportion; (3) chemical precipitation: the three transparent solutions are made into Nb-doped and heavily tin-doped indium hydroxide nano powder; (4) washing: the Nb-doped and heavily tin-doped tin indium hydroxide nano powder is washed by deionized water and then precipitated; (5) calcinating: the Nb-doped nano indium tin oxide powder is prepared by calcining the nano powder; (6) granulation: the Nb-doped nano indium tin oxide powder is mixed with a binder and then dried, so that Nb-doped nano indium tin oxide powder before molding can be prepared; (7) molding: the Nb-doped nano indium tin oxide powder before molding is pressed into initial blank; (8) sintering: the initial blank is sintered under the normal pressure, and the high density sputtering coating target of the Nb-doped indium tin oxide can be prepared.
(FR)
La présente invention se rapporte à un procédé de préparation d'une cible de revêtement par pulvérisation de densité élevée par une nanopoudre à base d'oxyde d'indium-étain dopée au niobium (Nb). Ledit procédé comprend les étapes suivantes : (1) la dissolution de métaux de pureté élevée tels que le niobium métallique de pureté élevée, l'indium métallique de pureté élevée et l'étain métallique de pureté élevée qui sont respectivement dissous dans un acide inorganique pour former des solutions transparentes ; (2) le mélange des solutions transparentes obtenues qui sont respectivement introduites dans des contenants selon la proportion ; (3) la précipitation chimique : les trois solutions transparentes sont composées d'une nanopoudre d'hydroxyde d'indium-étain dopée au niobium et fortement dopée à l'étain ; (4) le lavage : la nanopoudre d'hydroxyde d'indium-étain dopée au niobium et fortement dopée à l'étain est lavée à l'eau déminéralisée et ensuite précipitée ; (5) la calcination : la nanopoudre d'oxyde d'indium-étain dopée au niobium est préparée par calcination de la nanopoudre ; (6) la granulation : la nanopoudre d'oxyde d'indium-étain dopée au niobium est mélangée à un liant et ensuite séchée de telle sorte que la nanopoudre d'oxyde d'indium-étain dopée au niobium peut être préparée avant le moulage ; (7) le moulage : avant le moulage, la nanopoudre d'oxyde d'indium-étain dopée au niobium est pressée dans une ébauche initiale ; et (8) le frittage : l'ébauche initiale est frittée à une pression normale et la cible de revêtement par pulvérisation de densité élevée de l'oxyde d'indium-étain dopée au niobium peut être préparée.
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