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1. (WO2010150550) OPTICAL ELEMENT, ILLUMINATION APPARATUS, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING DEVICE
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2010/150550 International Application No.: PCT/JP2010/004232
Publication Date: 29.12.2010 International Filing Date: 25.06.2010
IPC:
G02B 5/00 (2006.01) ,C01B 31/02 (2006.01) ,G03F 7/20 (2006.01) ,H01L 21/027 (2006.01)
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5
Optical elements other than lenses
C CHEMISTRY; METALLURGY
01
INORGANIC CHEMISTRY
B
NON-METALLIC ELEMENTS; COMPOUNDS THEREOF
31
Carbon; Compounds thereof
02
Preparation of carbon; Purification
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
027
Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
Applicants: KIKUCHI, Makiko[JP/JP]; JP (UsOnly)
TAKI, Yusuke[JP/JP]; JP (UsOnly)
NIKON CORPORATION[JP/JP]; 12-1, Yurakucho 1-chome, Chiyoda-ku, Tokyo 1008331, JP (AllExceptUS)
Inventors: KIKUCHI, Makiko; JP
TAKI, Yusuke; JP
Agent: SHIGA, Masatake; 1-9-2, Marunouchi, Chiyoda-ku, Tokyo 1006620, JP
Priority Data:
2009-15079925.06.2009JP
Title (EN) OPTICAL ELEMENT, ILLUMINATION APPARATUS, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING DEVICE
(FR) ELÉMENT OPTIQUE, APPAREIL D'ÉCLAIRAGE, APPAREIL D'EXPOSITION ET PROCÉDÉ DE FABRICATION DE DISPOSITIF
(JA) 光学素子、照明装置、露光装置、及びデバイス製造方法
Abstract:
(EN) Disclosed is an optical element which contains a carbon nanotube assembly in a region that is irradiated with light.
(FR) L'invention porte sur un élément optique qui contient un ensemble de nanotubes de carbone dans une région qui est irradiée par de la lumière.
(JA)  光学素子は、光が照射される領域にカーボンナノチューブ集合体を含む。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)