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1. (WO2010147326) ANTENNA
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2010/147326    International Application No.:    PCT/KR2010/003637
Publication Date: 23.12.2010 International Filing Date: 07.06.2010
H01Q 21/00 (2006.01), H01Q 1/38 (2006.01), H01Q 9/04 (2006.01)
Applicants: EMW CO., LTD. [KR/KR]; 680-3 Gojan-dong, Namdong-gu Incheon 405-819 (KR) (For All Designated States Except US).
PARK, Young-Hwan [KR/KR]; (KR) (For US Only).
RYU, Ji-Woong [KR/KR]; (KR) (For US Only)
Inventors: PARK, Young-Hwan; (KR).
RYU, Ji-Woong; (KR)
Priority Data:
10-2009-0054830 19.06.2009 KR
(KO) 안테나
Abstract: front page image
(EN)The present invention relates to an antenna. The antenna can easily control capacitance components of a capacitor by adjusting the mutually-intersected area of two conductive structures which constitute the capacitor influencing the resonance frequency and impedance of the antenna. Therefore, the antenna is able to facilitate fine tuning for the resonance frequency. Even if the deviation of a sub-band channel (frequency) of an antenna is large, the antenna is capable of improving the capacitance components of the capacitor by controlling the capacitance components.
(FR)La présente invention porte sur une antenne. L'antenne peut facilement régler des composantes de capacité d'un condensateur par ajustement de l'aire d'intersection mutuelle de deux structures conductrices qui constituent le condensateur influant sur la fréquence de résonance et l'impédance de l'antenne. En conséquence, l'antenne peut faciliter un réglage fin de la fréquence de résonance. Même si la déviation d'un canal de sous-bande (fréquence) d'une antenne est grande, l'antenne est capable d'améliorer les composantes de capacité du condensateur par réglage des composantes de capacité.
(KO)본 발명은 안테나에 관한 것으로, 안테나의 공진주파수 및 임피던스에 영향을 주는 커패시터를 형성하는 두 도전성 구조체의 상호 교차면적을 조절하여 커패시터의 커패시턴스 성분을 쉽게 조정할 수 있으므로 공진주파수의 미세 튜닝이 용이하며, 안테나의 서비스밴드 채널(주파수) 편차가 크게 발생할 경우에도 커패시터의 커패시턴스 성분을 조정하여 이를 개선할 수 있는 이점이 있다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)