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1. (WO2010146970) GAS DISCHARGE STRUCTURE, AND DEVICE AND METHOD FOR PLASMA PROCESSING
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2010/146970    International Application No.:    PCT/JP2010/058733
Publication Date: 23.12.2010 International Filing Date: 24.05.2010
IPC:
C23C 16/44 (2006.01), B01J 3/02 (2006.01), H01L 21/3065 (2006.01)
Applicants: MITSUBISHI HEAVY INDUSTRIES, LTD. [JP/JP]; 16-5, Konan 2-chome, Minato-ku, Tokyo 1088215 (JP) (For All Designated States Except US).
MATSUDA Ryuichi [JP/JP]; (JP) (For US Only).
YOSHIDA Kazuto [JP/JP]; (JP) (For US Only)
Inventors: MATSUDA Ryuichi; (JP).
YOSHIDA Kazuto; (JP)
Agent: MITSUISHI Toshiro; Mitsuishi Law and Patent Office, 9-15, Akasaka 1-chome, Minato-ku, Tokyo 1070052 (JP)
Priority Data:
2009-145196 18.06.2009 JP
Title (EN) GAS DISCHARGE STRUCTURE, AND DEVICE AND METHOD FOR PLASMA PROCESSING
(FR) STRUCTURE DE DÉCHARGE DE GAZ, ET DISPOSITIF ET PROCÉDÉ DE TRAITEMENT AU PLASMA
(JA) 排気構造、プラズマ処理装置及び方法
Abstract: front page image
(EN)A gas discharge structure, and a device and a method for plasma processing which are capable of a uniform gas discharge and have improved maintainability. A pendulum gate valve (15) is eccentrically mounted to a vacuum chamber (11) in such a manner that the center (Mc) of the area of an opening region (M) corresponding to the center value of the recommended value for the use of the opening ratio of the pendulum gate valve (15) coincides with the axis center (Cc) of the vacuum chamber (11).
(FR)La présente invention concerne une structure de décharge de gaz, et un dispositif et un procédé de traitement au plasma qui peuvent décharger un gaz de manière uniforme et qui sont plus faciles à entretenir. Une vanne à clapet pendulaire (15) est montée excentrique à une chambre sous vide (11) de sorte que le centre (Mc) de la surface d'une zone d'ouverture (M) correspondant à la valeur centrale de la valeur recommandée pour l'utilisation du degré d'ouverture de la vanne à clapet pendulaire (15) coïncide avec le centre de l'axe (Cc) de la chambre sous vide (11).
(JA) 均一な排気を可能とすると共に、メンテナンス性を向上させた排気構造、プラズマ処理装置及び方法を提供する。そのため、振り子式ゲート弁15の開口率の使用推奨値の中心値における開口領域Mの面積中心Mcが真空チャンバ11の軸中心Ccに一致するように、振り子式ゲート弁15を偏心して真空チャンバ11に取り付けた。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)