WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2010143893) VINYL-CHLORIDE-BASED RESIN FOR FOAMING HAVING OUTSTANDING LOW-VISCOSITY CHARACTERISTICS, AND A PRODUCTION METHOD THEREFOR
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2010/143893    International Application No.:    PCT/KR2010/003720
Publication Date: 16.12.2010 International Filing Date: 10.06.2010
IPC:
C08F 259/04 (2006.01), C08F 214/06 (2006.01), C08F 2/18 (2006.01), E04F 15/00 (2006.01)
Applicants: LG CHEM, LTD. [KR/KR]; LG Twin Towers 20, Yeouido-dong, Yeongdeungpo-gu Seoul 150-721 (KR) (For All Designated States Except US).
SHIN, Hyun Jin [KR/KR]; (KR) (For US Only).
YOUK, Kyung Seog [KR/KR]; (KR) (For US Only).
KIM, Han Hong [KR/KR]; (KR) (For US Only)
Inventors: SHIN, Hyun Jin; (KR).
YOUK, Kyung Seog; (KR).
KIM, Han Hong; (KR)
Agent: KIM, In Han; Wellture International Patent Office 502, Korean Re Bldg. #80, Soosong-Dong, Chongno-Ku Seoul 110-733 (KR)
Priority Data:
10-2009-0051372 10.06.2009 KR
Title (EN) VINYL-CHLORIDE-BASED RESIN FOR FOAMING HAVING OUTSTANDING LOW-VISCOSITY CHARACTERISTICS, AND A PRODUCTION METHOD THEREFOR
(FR) RÉSINE À BASE DE CHLORURE DE VINYLE POUR LE MOUSSAGE AYANT DES CARACTÉRISTIQUES REMARQUABLES DE FAIBLE VISCOSITÉ, ET PROCÉDÉ DE FABRICATION DE CELLE-CI
(KO) 저점도 특성이 우수한 발포용 염화비닐계 수지 및 이의 제조방법
Abstract: front page image
(EN)The present invention relates to a vinyl-chloride-based resin made by the polymerisation of vinyl-chloride-based small seed particles having a mean particle size of from 0.15 to 0.5 μm produced by emulsion polymerisation, and vinyl-chloride-based large seed particles having a mean particle size of from 0.51 to 0.8 μm produced by suspension polymerisation, wherein the content ratio of the large seed particles relative to the small seed particles is from 1 to 2. The present invention also relates to a production method for the vinyl chloride based resin. The outstanding low viscosity characteristics at high shear and at low shear of the vinyl chloride resin can be brought out by adjusting the particle size of the small seeds produced by emulsion polymerisation.
(FR)La présente invention concerne une résine à base de chlorure de vinyle obtenue par la polymérisation de petites particules d'ensemencement à base de chlorure de vinyle, dont la dimension moyenne de particule est de 0,15 à 0,5 µm, obtenues par la polymérisation en émulsion, et des particules d'ensemencement de grande dimension à base de chlorure de vinyle, dont la dimension moyenne de particule est de 0,51 à 0,8 µm, obtenues par la polymérisation en suspension, le rapport de teneur des particules d'ensemencement de grande dimension par rapport aux particules d'ensemencement de petite dimension étant de 1 à 2. La présente invention concerne également un procédé de fabrication de la résine à base de chlorure de vinyle. Les caractéristiques remarquables de faible viscosité à cisaillement élevé et à faible cisaillement de la résine de chlorure de vinyle peuvent être révélées en ajustant la dimension de particule des particules d'ensemencement de petite dimension obtenues par la polymérisation en émulsion.
(KO)본 발명은 유화 중합으로 제조된 평균입경 0.15~0.5㎛인 염화비닐계 작은 시드 입자, 및 미세 현탁 중합으로 제조된 평균입경 0.51~0.8㎛의 염화비닐계 큰 시드 입자를 중합하여 이루어지며, 상기 작은 시드 입자에 대한 큰 시드 입자에 대한 함량비는 1~2인 것을 특징으로 하는 염화비닐계 수지와 이의 제조방법에 관한 것으로, 유화 중합으로 제조된 작은 시드의 입경을 조절하여 염화비닐 수지의 우수한 고전단 및 저전단에서 저점도 특성을 구현할 수 있다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)