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Pub. No.:    WO/2010/143319    International Application No.:    PCT/JP2009/067446
Publication Date: 16.12.2010 International Filing Date: 30.09.2009
A62B 18/02 (2006.01)
Applicants: SHIGEMATSU WORKS CO., LTD. [JP/JP]; 3-13-8, Sotokanda, Chiyoda-ku, Tokyo 1010021 (JP) (For All Designated States Except US).
ONO Kenichi [JP/JP]; (JP) (For US Only).
SHIMADA Shuichiro [JP/JP]; (JP) (For US Only).
TAKAYAMA Yusuke [JP/JP]; (JP) (For US Only)
Inventors: ONO Kenichi; (JP).
SHIMADA Shuichiro; (JP).
Agent: TANAKA Hiroshi; Hougaku Bldg. 7F, 19-14, Toranomon 1-chome, Minato-ku, Tokyo 1050001 (JP)
Priority Data:
2009-141257 12.06.2009 JP
(JA) 鼻部クッション付きマスク
Abstract: front page image
(EN)Provided is a mask with a nasal cushion, the mask consisting of a filter that filters dust, wherein the edges of the filter are folded back to create flaps that follow the depressions on both sides of the nasal region. A sponge of urethane foam or the like is affixed inside the flaps, thereby improving the fit of the mask by conforming the mask to the contours of the nasal region, resulting in a mask with a nasal cushion that has cushioning properties and strong protective capabilities.
(FR)L'invention porte sur un masque avec un coussin nasal, lequel masque est constitué par un filtre qui filtre la poussière, les bords du filtre étant empilés de façon à créer des volets qui suivent les dépressions des deux côtés de la région nasale. Une éponge de mousse d'uréthane, ou analogue, est fixée à l'intérieur des volets, de façon à améliorer ainsi l'adaptation du masque par conformation du masque aux contours de la région nasale, produisant en résultat un masque avec un coussin nasal qui a des propriétés d'amortissement et de fortes capacités de protection.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)