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Machine translation
1. (WO2010139390) TWO COMPONENT ETCHING
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2010/139390    International Application No.:    PCT/EP2010/002949
Publication Date: 09.12.2010 International Filing Date: 12.05.2010
IPC:
C09K 13/08 (2006.01)
Applicants: MERCK PATENT GMBH [DE/DE]; Frankfurter Strasse 250 64293 Darmstadt (DE) (For All Designated States Except US).
DOLL, Oliver [DE/DE]; (DE) (For US Only).
PLUMMER, Edward [GB/DE]; (DE) (For US Only).
JAMES, Mark [GB/GB]; (GB) (For US Only).
KOEHLER, lngo [DE/DE]; (DE) (For US Only)
Inventors: DOLL, Oliver; (DE).
PLUMMER, Edward; (DE).
JAMES, Mark; (GB).
KOEHLER, lngo; (DE)
Priority Data:
09007411.3 04.06.2009 EP
Title (EN) TWO COMPONENT ETCHING
(FR) GRAVURE À DEUX COMPOSANTS
Abstract: front page image
(EN)The object of the present invention is a new inkjet printable etching composition comprising an etchant, which is activated by a second component. Thus, a further object is the use of this new composition in a process for the etching of surfaces semiconductor devices or surfaces of solar cell devices.
(FR)L'objet de la présente invention consiste en une nouvelle composition de gravure imprimable par jet d'encre comprenant un agent de gravure, qui est activé par un second composant. Ainsi, un autre objet consiste en l'utilisation de cette nouvelle composition dans un processus de gravure de surfaces de dispositifs à semi-conducteurs ou de surfaces de dispositifs de cellule solaire.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)