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1. (WO2010137742) PROCESS FOR PRODUCING VINYL ETHER
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2010/137742    International Application No.:    PCT/JP2010/059488
Publication Date: 02.12.2010 International Filing Date: 28.05.2010
IPC:
C07C 41/08 (2006.01), C07C 43/18 (2006.01), C07B 61/00 (2006.01), C07D 233/70 (2006.01)
Applicants: NIPPON CARBIDE INDUSTRIES CO., INC. [JP/JP]; 11-19, Konan 2-chome, Minato-ku, Tokyo 1088466 (JP) (For All Designated States Except US).
KAKINUMA, Shinichi [JP/JP]; (JP) (For US Only).
MITA, Shinya [JP/JP]; (JP) (For US Only).
MUROTANI, Masahiro [JP/JP]; (JP) (For US Only)
Inventors: KAKINUMA, Shinichi; (JP).
MITA, Shinya; (JP).
MUROTANI, Masahiro; (JP)
Agent: AOKI, Atsushi; SEIWA PATENT & LAW, Toranomon 37 Mori Bldg., 5-1, Toranomon 3-chome, Minato-ku, Tokyo 1058423 (JP)
Priority Data:
2009-129969 29.05.2009 JP
Title (EN) PROCESS FOR PRODUCING VINYL ETHER
(FR) PROCÉDÉ DE PRODUCTION D'ÉTHER VINYLIQUE
(JA) ビニルエーテルの製造方法
Abstract: front page image
(EN)A process for efficiently producing a high-purity vinyl ether represented by formula (1) from a tertiary alcohol having low reactivity is provided, the process comprising reacting acetylene with the tertiary alcohol in the presence of a base using a cyclic urea compound, a glyme compound, or a mixture of these as a solvent.
(FR)L'invention concerne un procédé permettant de produire efficacement un éther vinylique de grande pureté représenté par la formule (1), à partir d'un alcool tertiaire présentant une faible réactivité, le procédé comprenant la mise en réaction d'acétylène avec l'alcool tertiaire en présence d'une base, au moyen d'un composé d'urée cyclique, d'un composé d'éther diméthylique de l'éthylèneglycol ou d'un mélange de ceux-ci comme solvant.
(JA) 塩基の存在下に、アセチレンと第3級アルコールとを、溶媒として、環状尿素化合物もしくはグライ ム系化合物またはこれらの混合物を用いて反応させ、反応性の低い第3級アルコールから効率的に高純 度の下記式(1)で示されるビニルエーテルを製造する方法を提供する。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)