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1. (WO2010136654) MICROMECHANICAL TUNABLE FABRY-PEROT INTERFEROMETER, AN INTERMEDIATE PRODUCT, AND A METHOD FOR PRODUCING THE SAME
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2010/136654 International Application No.: PCT/FI2010/050434
Publication Date: 02.12.2010 International Filing Date: 28.05.2010
IPC:
G01J 3/26 (2006.01) ,G02B 5/28 (2006.01)
G PHYSICS
01
MEASURING; TESTING
J
MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
3
Spectrometry; Spectrophotometry; Monochromators; Measuring colours
12
Generating the spectrum; Monochromators
26
using multiple reflection, e.g. Fabry-Perot interferometer, variable interference filter
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5
Optical elements other than lenses
20
Filters
28
Interference filters
Applicants:
TEKNOLOGIAN TUTKIMUSKESKUS VTT [FI/FI]; Vuorimiehentie 3 FI-02044 Vtt, FI (AllExceptUS)
BLOMBERG, Martti [FI/FI]; FI (UsOnly)
Inventors:
BLOMBERG, Martti; FI
Agent:
IPR PARTNERS OY; Bulevardi 2-4 FI-00120 Helsinki, FI
Priority Data:
2009560229.05.2009FI
Title (EN) MICROMECHANICAL TUNABLE FABRY-PEROT INTERFEROMETER, AN INTERMEDIATE PRODUCT, AND A METHOD FOR PRODUCING THE SAME
(FR) INTERFÉROMÈTRE DE FABRY-PÉROT À ACCORDAGE MICROMÉCANIQUE, PRODUIT INTERMÉDIAIRE ET PROCÉDÉ DE FABRICATION
Abstract:
(EN) The invention relates to controllable Fabry-Perot interferometers which are produced with micromechanical (MEMS) technology. Producing prior art interferometers includes a risk of deterioration of mirrors during the etching of the sacrificial layer (123). According to the solution according to the invention at least one layer (103, 105, 114, 116) of the mirrors is made of silicon-rich silicon nitride. In the inventive Fabry-Perot interferometer it is possible to avoid or reduce using silicon oxide in the mirror layers whereby the risk of deterioration of the mirrors is reduced. It is also possible to use mirror surfaces with higher roughness, whereby the risk of the mirrors sticking to each other is reduced.
(FR) L'invention concerne des interféromètres de Fabry-Pérot pouvant être commandés et dont le mode de production implique une technologie micromécanique (MEMS). Au cours de la production des interféromètres de l'art antérieur, les miroirs sont susceptibles d'être détériorés lors de la gravure la couche sacrificielle (123). La présente invention propose comme solution l'utilisation de miroirs comportant au moins une couche (103, 105,114, 116) composée de nitrure de silicium enrichi en silicium. L'utilisation d'oxyde de silicium dans les couches des miroirs des interféromètres de Fabry-Pérot de la présente invention peut être évitée ou réduite, ce qui permet de réduire le risque de détérioration des miroirs. Il est également possible d'utiliser des miroirs à surface plus rugueuse pour réduire le risque d'adhérence des miroirs les uns sur les autres.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
EP2438411US20120050751JP2012528345CN102449447