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1. (WO2010119641) PATTERN MEASURING APPARATUS AND COMPUTER PROGRAM

Pub. No.:    WO/2010/119641    International Application No.:    PCT/JP2010/002524
Publication Date: Fri Oct 22 01:59:59 CEST 2010 International Filing Date: Thu Apr 08 01:59:59 CEST 2010
IPC: G01B 15/04
H01L 21/027
Applicants: HITACHI HIGH-TECHNOLOGIES CORPORATION
株式会社 日立ハイテクノロジーズ
MOCHIZUKI, Yuzuru
望月譲
TANAKA, Maki
田中麻紀
ISAWA, Miki
伊澤美紀
YAMAGUCHI, Satoru
山口聡
Inventors: MOCHIZUKI, Yuzuru
望月譲
TANAKA, Maki
田中麻紀
ISAWA, Miki
伊澤美紀
YAMAGUCHI, Satoru
山口聡
Title: PATTERN MEASURING APPARATUS AND COMPUTER PROGRAM
Abstract:
Provided are a pattern measuring apparatus and a computer program which determine whether a gap formed in a sample (201) is a core gap (211) or a spacer gap (212). The secondary electron profile of the sample (201) is acquired, the feature quantities of the secondary electron profile at the positions of edges (303, 305) are detected, and based on the detected feature quantities, whether each gap adjacent to each of the edges (303, 305) is the core gap (211) or the spacer gap (212) is determined. Furthermore, the waveform profile of the spacer (207) is previously stored, the secondary electron profile of the sample (201) is acquired, a matching degree of the secondary electron profile and the stored waveform profile at the position of each spacer (207) is detected, and based on the detected matching degree, whether the each gap adjacent to each spacer (207) is the core gap (211) or the spacer gap (212) is determined.