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1. (WO2010118336) DIBLOCK COPOLYMER MODIFIED NANOPARTICLE-POLYMER NANOCOMPOSITES FOR ELECTRICAL INSULATION
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2010/118336 International Application No.: PCT/US2010/030561
Publication Date: 14.10.2010 International Filing Date: 09.04.2010
Chapter 2 Demand Filed: 20.09.2010
IPC:
C08F 292/00 (2006.01) ,C08F 293/00 (2006.01) ,C08L 51/10 (2006.01) ,C08K 9/08 (2006.01) ,C08L 63/00 (2006.01) ,H01B 3/40 (2006.01) ,C08J 5/00 (2006.01) ,B82B 3/00 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
292
Macromolecular compounds obtained by polymerising monomers on to inorganic materials
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
293
Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
51
Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
10
grafted on to inorganic materials
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
K
USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES AS COMPOUNDING INGREDIENTS
9
Use of pretreated ingredients
08
Ingredients agglomerated by treatment with a binding agent
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
63
Compositions of epoxy resins; Compositions of derivatives of epoxy resins
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
B
CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
3
Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
18
mainly consisting of organic substances
30
plastics; resins; waxes
40
epoxy resins
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
J
WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H142
5
Manufacture of articles or shaped materials containing macromolecular substances
B PERFORMING OPERATIONS; TRANSPORTING
82
NANO-TECHNOLOGY
B
NANO-STRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
3
Manufacture or treatment of nano-structures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
Applicants: SCHADLER, Linda[US/US]; US (UsOnly)
HILLBORG, Henrik[SE/SE]; SE (UsOnly)
BENICEWICZ, Brian[US/US]; US (UsOnly)
ZHAO, Su[CN/SE]; SE (UsOnly)
RENSSELAER POLYTECHNIC INSTITUTE[US/US]; J Building 110 8th Street Troy, NY 12180, US (AllExceptUS)
Inventors: SCHADLER, Linda; US
HILLBORG, Henrik; SE
BENICEWICZ, Brian; US
ZHAO, Su; SE
Agent: REESE, Brian; Heslin Rothenberg Farley & Mesiti P.C. 5 Columbia Circle Albany, NY 12203, US
Priority Data:
61/212,40910.04.2009US
Title (EN) DIBLOCK COPOLYMER MODIFIED NANOPARTICLE-POLYMER NANOCOMPOSITES FOR ELECTRICAL INSULATION
(FR) NANOCOMPOSITES NANOPARTICULE-POLYMÈRE MODIFIÉES PAR UN COPOLYMÈRE DIBLOC POUR L'ISOLATION ÉLECTRIQUE
Abstract:
(EN) The invention relates to an electric insulation material including modified nanoparticles, a porous substrate and polymer matrix, wherein the modified nanoparticles include a nanoparticle and a diblock copolymer covalently attached to the nanoparticle, the diblock copolymer including a first block polymer of molecular weight greater than 1000 and a glass transition temperature below room temperature attached to the nanoparticle and a second block polymer of molecular weight greater than 1000 covalently linked to the first block polymer, wherein the second block polymer and the matrix both possess the same chemical functionality. Other electrical insulation materials and methods of making such electrical insulation materials are also disclosed.
(FR) L'invention porte sur un matériau d'isolation électrique comprenant des nanoparticules modifiées, un substrat poreux et une matrice de polymère, dans lequel les nanoparticules modifiées comprennent une nanoparticule et un copolymère dibloc lié de façon covalente à la nanoparticule, le copolymère dibloc comprenant un premier bloc polymère ayant une masse moléculaire supérieure à 1 000 et une température de transition vitreuse au-dessous de la température ambiante, attaché à la nanoparticule et un second bloc polymère, de masse moléculaire supérieure à 1 000, lié de façon covalente au premier bloc polymère, le second bloc polymère et la matrice possédant tous deux la même fonctionnalité chimique. L'invention porte également sur d'autres matières d'isolation électrique et de procédés de fabrication de ces matières d'isolation électrique.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (EPO) (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)