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1. (WO2010118234) TECHNIQUES FOR PROCESSING A SUBSTRATE

Pub. No.:    WO/2010/118234    International Application No.:    PCT/US2010/030395
Publication Date: Fri Oct 15 01:59:59 CEST 2010 International Filing Date: Fri Apr 09 01:59:59 CEST 2010
IPC: H01L 21/265
Applicants: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES
DANIELS, Kevin, M.
LOW, Russell, J.
RIORDON, Benjamin, B.
BATEMAN, Nicholas, P., T.
Inventors: DANIELS, Kevin, M.
LOW, Russell, J.
RIORDON, Benjamin, B.
BATEMAN, Nicholas, P., T.
Title: TECHNIQUES FOR PROCESSING A SUBSTRATE
Abstract:
Herein, an improved technique for processing a substrate is disclosed. In one particular exemplary embodiment, the technique may be achieved using a mask for processing the substrate. The mask may be incorporated into a substrate processing system such as, for example, an ion implantation system. The mask may comprise one or more first apertures disposed in a first row; and one or more second apertures disposed in a second row, each row extending along a width direction of the mask, wherein the one or more first apertures and the one or more second apertures are non-uniform.