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1. (WO2010118206) PROCESS AND APPARATUS FOR REMOVAL OF CONTAMINATING MATERIAL FROM SUBSTRATES

Pub. No.:    WO/2010/118206    International Application No.:    PCT/US2010/030349
Publication Date: Fri Oct 15 01:59:59 CEST 2010 International Filing Date: Fri Apr 09 01:59:59 CEST 2010
IPC: C11D 7/32
G03F 7/42
Applicants: SUNSONIX
TREICHEL, Helmuth
BOHLING, Dave
FARBER, Jeff
Inventors: TREICHEL, Helmuth
BOHLING, Dave
FARBER, Jeff
Title: PROCESS AND APPARATUS FOR REMOVAL OF CONTAMINATING MATERIAL FROM SUBSTRATES
Abstract:
A process for removing contaminating metals from a substrate to improve electrical performance is provided. Polycationic metals are known to be particularly detrimental to the electrical properties of an insulator or semiconductor substrate. The process includes the exposure of the substrate to an aqueous solution of at least one compound of the formula: (I) where n in each occurrence is independently an integer value between 0 and 6, and X is independently in each occurrence H, NR4, Li, Na or K and at least one of X is NR4; where R in each occurrence is independently H or C1-C6 alkyl, to improve electrical performance of the substrate. A kit for preparing such a solution includes a 1-20 total weight percent aqueous concentrate of at least one compound of formula (I). The kit also provides instructions for the dilution of the concentrate to form the solution.