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1. (WO2010117598) HYDROPHOBIC MONOMERS, HYDROPHOBICALLY-DERIVATIZED SUPPORTS, AND METHODS OF MAKING AND USING THE SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2010/117598 International Application No.: PCT/US2010/027978
Publication Date: 14.10.2010 International Filing Date: 19.03.2010
IPC:
C07C 233/09 (2006.01) ,C08F 20/54 (2006.01) ,C08J 9/08 (2006.01) ,B01J 20/285 (2006.01) ,B01D 71/56 (2006.01)
Applicants: RASMUSSEN, Jerald K.[US/US]; US (UsOnly)
KIPKE, Cary A.[US/US]; US (UsOnly)
HEMBRE, James I.[US/US]; US (UsOnly)
WICKERT, Peter D.[US/US]; US (UsOnly)
3M INNOVATIVE PROPERTIES COMPANY[US/US]; 3M Center Post Office Box 33427 Saint Paul, Minnesota 55133-3427, US (AllExceptUS)
Inventors: RASMUSSEN, Jerald K.; US
KIPKE, Cary A.; US
HEMBRE, James I.; US
WICKERT, Peter D.; US
Agent: LAPOS-KUCHAR, Julie A.; 3M Center Office of Intellectual Property Counsel Post Office Box 33427 Saint Paul, Minnesota 55133-3427, US
Priority Data:
61/165,13231.03.2009US
Title (EN) HYDROPHOBIC MONOMERS, HYDROPHOBICALLY-DERIVATIZED SUPPORTS, AND METHODS OF MAKING AND USING THE SAME
(FR) MONOMÈRES HYDROPHOBES, SUPPORTS HYDROPHOBIQUEMENT DÉRIVATISÉS ET LEURS PROCÉDÉS DE FABRICATION ET D'UTILISATION
Abstract: front page image
(EN) A composition is disclosed comprising a hydrophobic monomer having the structure:CH2=CR4C(O)NHC(R1R1)(C(R1R1))nC(O)XR3 wherein n is an integer of 0 or 1; R1 is independently selected from at least one of: a hydrogen atom, alkyls, aryls, and alkylaryls, wherein the alkyls, aryls, and alkylaryls have a total of 10 carbon atoms or less; R3 is a hydrophobic group selected from at least one of: alkyls, aryls, alkylaryls and ethers, wherein the alkyls, aryls, alkylaryls and ethers have a total number of carbon atoms ranging from 4 to 30; R4 is H or CH3; X is O or NH. In some embodiments the hydrophobic monomer is derived from an amine or an alcohol (HXR3) that has a hydrophilicity index of 25 or less. A polymerizable composition comprising the hydrophobic monomer is disclosed, which optionally may comprise a cross-linking monomer and/or a non-cross-linking monomer. This polymerizable mixture may be used to from hydrophobically-derivatized supports, which may be used in applications such as hydrophobic interaction chromatography.
(FR) La présente invention concerne une composition comprenant un monomère hydrophobe de formule CH2=CR4C(O)NHC(R1R1)(C(R1R1))nC(O)XR3, où n est un nombre entier de 0 à 1 ; R1 est choisi librement parmi au moins l'un des éléments suivants : un atome d'hydrogène, des groupes alkyle, aryle et alkylaryle, lesdits groupes alkyle, aryle et alkylaryle comportant au total 10 atomes de carbone au plus ; R3 est un groupe hydrophobe choisi parmi au moins l'un des éléments suivants : groupes alkyle, aryle, alkylaryle et éther, lesdits groupes alkyle, aryle, alkylaryle et éther comportant un nombre total d'atomes de carbone allant de 4 à 30 ; R4 représente H ou CH3 ; X représente O ou NH. Dans certains modes de réalisation, le monomère hydrophobe est issu d'une amine ou d'un alcool (HXR3) dont l'indice d'hydrophilicité est inférieur ou égal à 25. L'invention concerne également une composition polymérisable comprenant ledit monomère hydrophobe et pouvant éventuellement comprendre un monomère réticulant et/ou un monomère non réticulant. Ce mélange polymérisable peut servir à la fabrication de supports hydrophobiquement dérivatisés, qui peuvent être utilisés dans des applications telles que la chromatographie d'interaction hydrophobe.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (EPO) (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)