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1. (WO2010116574) ACTIVE MATRIX SUBSTRATE, DISPLAY PANEL, DISPLAY DEVICE, AND LASER IRRADIATION METHOD
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2010/116574    International Application No.:    PCT/JP2009/071760
Publication Date: 14.10.2010 International Filing Date: 28.12.2009
IPC:
G09F 9/00 (2006.01), G02F 1/1368 (2006.01), G09F 9/30 (2006.01)
Applicants: SHARP KABUSHIKI KAISHA [JP/JP]; 22-22, Nagaike-Cho, Abeno-Ku, Osaka-Shi, Osaka 5458522 (JP) (For All Designated States Except US).
KANEKO Toshihiro; (For US Only)
Inventors: KANEKO Toshihiro;
Agent: SANO Shizuo; Tenmabashi-Yachiyo Bldg. Bekkan, 2-6, Tenmabashi-Kyomachi, Chuo-Ku, Osaka-Shi, Osaka 5400032 (JP)
Priority Data:
2009-095754 10.04.2009 JP
Title (EN) ACTIVE MATRIX SUBSTRATE, DISPLAY PANEL, DISPLAY DEVICE, AND LASER IRRADIATION METHOD
(FR) SUBSTRAT DE MATRICE ACTIVE, PANNEAU D'AFFICHAGE, DISPOSITIF D'AFFICHAGE ET PROCÉDÉ D'IRRADIATION LASER
(JA) アクティブマトリックス基板、表示パネル、表示装置、およびレーザ照射方法
Abstract: front page image
(EN)In an active matrix substrate (29), a part of the drain electrode (15) of a TFT (10), which corresponds to an auxiliary capacitor electrode (26), is overlapped with a capacitor signal line (25). The auxiliary capacitor electrode (26) includes a notch (27).
(FR)Selon l'invention, dans un substrat de matrice active (29), une partie de l'électrode de drain (15) d'un TFT (10), qui correspond à une électrode de condensateur auxiliaire (26), est chevauchée par une ligne de signal de condensateur (25). L'électrode de condensateur auxiliaire (26) comprend une encoche (27).
(JA) TFT(10)のドレイン電極(15)の一部(補助容量電極26)と、容量信号線(25)とを重ね合わせたアクティブマトリックス基板(29)にて、補助容量電極(26)は、切欠(27)を含む。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)