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1. (WO2010115816) PROCESS CHAMBER HAVING MODULATED PLASMA SUPPLY

Pub. No.:    WO/2010/115816    International Application No.:    PCT/EP2010/054340
Publication Date: Fri Oct 15 01:59:59 CEST 2010 International Filing Date: Thu Apr 01 01:59:59 CEST 2010
IPC: H01J 37/32
Applicants: Forschungsverbund Berlin e. V.
GESCHE, Roland
Inventors: GESCHE, Roland
Title: PROCESS CHAMBER HAVING MODULATED PLASMA SUPPLY
Abstract:
The invention relates to a plasma chamber (10, 20, 30) having a first receiving device for a substrate (14, 24, 34) fastened to a first side and having a plasma generation unit for generating a plasma in the plasma chamber, wherein the plasma generation unit is connected or can be connected to a high frequency voltage supply (11, 21, 31). The high frequency voltage supply is designed to generate a modulated, high-frequency alternating voltage and to output said voltage to the plasma generation unit. The plasma generation unit is designed to generate the plasma using the modulated, high-frequency alternating voltage.