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Machine translation
1. (WO2010115796) COMPOSITION FOR METAL PLATING COMPRISING SUPPRESSING AGENT FOR VOID FREE SUBMICRON FEATURE FILLING
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2010/115796    International Application No.:    PCT/EP2010/054281
Publication Date: 14.10.2010 International Filing Date: 31.03.2010
IPC:
C25D 3/38 (2006.01), C23C 18/31 (2006.01), C23C 18/32 (2006.01), H01L 21/288 (2006.01), H05K 3/18 (2006.01), H05K 3/24 (2006.01), C25D 3/58 (2006.01)
Applicants: BASF SE [DE/DE]; 67056 Ludwigshafen (DE) (For All Designated States Except US).
RÖGER-GÖPFERT, Cornelia [DE/DE]; (DE) (For US Only).
RAETHER, Roman Benedikt [DE/DE]; (DE) (For US Only).
EMNET, Charlotte [DE/DE]; (DE) (For US Only).
HAAG, Alexandra [DE/DE]; (DE) (For US Only).
MAYER, Dieter [DE/DE]; (DE) (For US Only)
Inventors: RÖGER-GÖPFERT, Cornelia; (DE).
RAETHER, Roman Benedikt; (DE).
EMNET, Charlotte; (DE).
HAAG, Alexandra; (DE).
MAYER, Dieter; (DE)
Common
Representative:
BASF SE; 67056 Ludwigshafen (DE)
Priority Data:
09157540.7 07.04.2009 EP
61/256,328 30.10.2009 US
Title (EN) COMPOSITION FOR METAL PLATING COMPRISING SUPPRESSING AGENT FOR VOID FREE SUBMICRON FEATURE FILLING
(FR) COMPOSITION POUR PLAQUAGE MÉTALLIQUE COMPRENANT UN AGENT DE SUPPRESSION POUR REMPLISSAGE PAR ÉLÉMENTS SUBMICRONIQUES SANS VIDE
Abstract: front page image
(EN)Composition comprising a source of metal ions and at least one suppressing agent obtainable by reacting a) an amine compound comprising at least three active amino functional groups with b) a mixture of ethylene oxide and at least one compound selected from C3 and C4 alkylene oxides.
(FR)L'invention porte sur une composition comprenant une source d'ions métalliques et au moins un agent de suppression, laquelle composition peut être obtenue en faisant réagir a) un composé d'amine comprenant au moins trois groupes fonctionnels amino-actifs avec b) un mélange d'oxyde d'éthylène et d'au moins un composé sélectionné parmi des oxydes d'alkylène C3 et C4.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)