WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2010115075) ETCHANT COMPOSITION AND METHOD
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2010/115075 International Application No.: PCT/US2010/029741
Publication Date: 07.10.2010 International Filing Date: 02.04.2010
Chapter 2 Demand Filed: 01.02.2011
IPC:
C23F 1/18 (2006.01) ,C09K 13/06 (2006.01)
Applicants: DURANTE, Robert, Jeffrey[US/US]; US (UsOnly)
LEE, Seung Jin[KR/KR]; KR (UsOnly)
TUFANO, Thomas, Peter[US/US]; US (UsOnly)
PARK, Young Chul[KR/KR]; KR (UsOnly)
LEE, Jun Woo[KR/KR]; KR (UsOnly)
LEE, Seung Yong[KR/KR]; KR (UsOnly)
LEE, Hyun Kyu[KR/KR]; KR (UsOnly)
LEE, Yu Jin[KR/KR]; KR (UsOnly)
JANF, Sang Hoon[KR/KR]; KR (UsOnly)
E. I. DU PONT DE NEMOURS AND COMPANY[US/US]; 1007 Market Street Wilmington, Delaware 19898, US (AllExceptUS)
DONGWOO FINE-CHEM COMPANY, LTD[KR/KR]; 8th Floor, City Air Tower, 159-9, Samsung-Dong Kangnam-Gu Seoul 135-973, KR (AllExceptUS)
Inventors: DURANTE, Robert, Jeffrey; US
LEE, Seung Jin; KR
TUFANO, Thomas, Peter; US
PARK, Young Chul; KR
LEE, Jun Woo; KR
LEE, Seung Yong; KR
LEE, Hyun Kyu; KR
LEE, Yu Jin; KR
JANF, Sang Hoon; KR
Agent: MAYER, Nancy, S.; E. I. du Pont de Nemours and Company Legal Patent Records Center 4417 Lancaster Pike Wilmington, Delaware 19805, US
Priority Data:
12/721,90311.03.2010US
61/166,26703.04.2009US
61/166,27303.04.2009US
Title (EN) ETCHANT COMPOSITION AND METHOD
(FR) COMPOSITION D'AGENT D'ATTAQUE CHIMIQUE ET PROCÉDÉ
Abstract: front page image
(EN) The present invention provides an etchant composition comprising A) high strength potassium monopersulfate providing from about 0.025% to about 0.8% by weight of active oxygen; B) from about 0.01% to about 30% by weight of the composition of B1) an organic acid, alkali metal salt of an organic acid, ammonium salt of an organic acid, or a homopolymer of an organic acid, or B2) a halogen or nitrate salt of phosphonium, tetrazolium, or benzolium, or B3) a mixture of component B1) and B2); and C) from about 0% to about 97.49% by weight of the composition of water; and a method of etching a substrate using said composition.
(FR) La présente invention concerne une composition d'agent d'attaque chimique comprenant A) du monopersulfate potassique haute résistance apportant d'environ 0,025 % à environ 0,8 % en poids d'oxygène actif ; B) d'environ 0,01 % à environ 30 % en poids de la composition de B1) un acide organique, un sel métallique alcalin d'un acide organique, du sel d'ammonium d'un acide organique ou un homopolymère d'un acide organique, ou de B2) un halogène ou un sel de nitrate de phosphonium, tétrazolium ou benzolium, ou de B3) un mélange des composants B1) et B2) ; et C) d'environ 0 % à environ 97,49 % en poids de la composition d'eau ; et un procédé d'attaque chimique d'un substrat à l'aide de ladite composition.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (EPO) (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)