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Machine translation
1. (WO2010115027) METHODS OF PATTERNING SUBSTRATES USING MICROCONTACT PRINTED POLYMER RESISTS AND ARTICLES PREPARED THEREFROM
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2010/115027 International Application No.: PCT/US2010/029665
Publication Date: 07.10.2010 International Filing Date: 01.04.2010
IPC:
G03F 1/00 (2006.01)
Applicants: AGARWAL, Sandip[IN/US]; US (UsOnly)
MAYERS, Brian, T.[US/US]; US (UsOnly)
MCLELLAN, Joseph, M.[US/US]; US (UsOnly)
KUGLER, Ralf[DE/US]; US (UsOnly)
KURSAWE, Monika[DE/DE]; DE (UsOnly)
NANO TERRA INC.[US/US]; 790 Memorial Dirve Suite 202 Cambridge, MA 02139, US (AllExceptUS)
MERCK PATENT GMBH[DE/DE]; Frankfurter Str. 250 64293 Darmstadt, DE (AllExceptUS)
Inventors: AGARWAL, Sandip; US
MAYERS, Brian, T.; US
MCLELLAN, Joseph, M.; US
KUGLER, Ralf; US
KURSAWE, Monika; DE
Agent: FEATHERSTONE, Donal, J.; Sterne Kessler Goldstein & Fox PLLC 1100 New York Avenue NW Washington, DC 20005, US
Priority Data:
61/165,75501.04.2009US
Title (EN) METHODS OF PATTERNING SUBSTRATES USING MICROCONTACT PRINTED POLYMER RESISTS AND ARTICLES PREPARED THEREFROM
(FR) PROCÉDÉS DE CONFIGURATION DE SUBSTRATS À L'AIDE DE RÉSISTS POLYMÈRES IMPRIMÉS PAR MICROCONTACT ET ARTICLES PRÉPARÉS À PARTIR DE CEUX-CI
Abstract: front page image
(EN) The present invention is directed to methods for patterning substrates using contact printing to form patterns comprising a polymer, using the patterns formed therefrom as resists, and process products formed by the process.
(FR) La présente invention concerne des procédés de configuration de substrats à l'aide d'une impression par contact pour former des motifs comprenant un polymère, à l'aide des motifs formés à partir de ceux-ci en tant que résists, et elle concerne également des produits formés par le procédé.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (EPO) (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)