WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2010114925) SPINOUS PROCESS IMPLANTS AND ASSOCIATED METHODS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2010/114925    International Application No.:    PCT/US2010/029479
Publication Date: 07.10.2010 International Filing Date: 31.03.2010
IPC:
A61B 17/70 (2006.01)
Applicants: LANX, INC. [US/US]; 390 Interlocken Crescent Suite 890 Broomfield, CO 80021 (US) (For All Designated States Except US).
TABER, Justin [US/US]; (US) (For US Only).
LAMBORNE, Andrew [US/US]; (US) (For US Only).
FULTON, Michael [US/US]; (US) (For US Only).
THRAMANN, Jeffrey [US/US]; (US) (For US Only)
Inventors: TABER, Justin; (US).
LAMBORNE, Andrew; (US).
FULTON, Michael; (US).
THRAMANN, Jeffrey; (US)
Agent: OSTERLOTH, Gregory, W.; Holland & Hart, LLP P.O. Box 8749 Denver, CO 80201 (US)
Priority Data:
61/165,354 31.03.2009 US
Title (EN) SPINOUS PROCESS IMPLANTS AND ASSOCIATED METHODS
(FR) IMPLANTS POUR APOPHYSE ÉPINEUSE ET PROCÉDÉS ASSOCIÉS
Abstract: front page image
(EN)The present invention provides spinous process implant and associated methods. In one aspect of the invention the implant limits the maximum spacing between the spinous processes. In another aspect of the invention, a spacer has at least one transverse opening to facilitate tissue in-growth. In another aspect of the invention, an implant includes a spacer and separate extensions engageable with the spacer. In another aspect of the invention. instrumentation for inserting the implant is provided In other aspects of the invention, methods for treating spine disease are provided.
(FR)La présente invention porte sur un implant pour apophyse épineuse et sur des procédés associés. Sous un aspect de l'invention, l'implant limite l'espacement maximal entre les apophyses épineuses. Sous un autre aspect de l'invention, un espaceur comporte au moins une ouverture transversale destinée à faciliter une croissance intérieure de tissu. Sous un autre aspect de l'invention, l'implant comprend un espaceur et des extensions séparées engageables avec l'espaceur. Sous un autre aspect de l'invention, on décrit une instrumentation destinée à introduire l'implant. Sous d'autres aspects de l'invention, on décrit des procédés de traitement d'une maladie de la colonne vertébrale.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)