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1. (WO2010114325) GAS/LIQUID CONTACTING PLATE HAVING IMPROVED GAS/LIQUID CONTACTING ABILITY
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2010/114325    International Application No.:    PCT/KR2010/002025
Publication Date: 07.10.2010 International Filing Date: 01.04.2010
IPC:
B01J 10/00 (2006.01), B01D 3/26 (2006.01), B01D 3/16 (2006.01)
Applicants: YANG, Sa Heon [KR/KR]; (KR)
Inventors: YANG, Sa Heon; (KR)
Agent: PARK, Chang nam; 3fl,. Myung-Ji B/D 1572-12 Seocho-3 dong, Seocho-ku Seoul 137-874 (KR)
Priority Data:
10-2009-0028045 01.04.2009 KR
Title (EN) GAS/LIQUID CONTACTING PLATE HAVING IMPROVED GAS/LIQUID CONTACTING ABILITY
(FR) PLAQUE DE CONTACT GAZ/LIQUIDE À CAPACITÉ AMÉLIORÉE DE CONTACT GAZ/LIQUIDE
(KO) 기액접촉 능력이 향상된 기액접촉판
Abstract: front page image
(EN)The gas/liquid contacting plate having improved gas/liquid contacting ability of the present invention comprises: a base formed with a curved surface so as to increase the time of contact and the surface area of contact with a gas or liquid; and a resin coating layer which is coated onto or impregnated into the surfaces on both sides of the base, in a state in which the curvature of the base is maintained.
(FR)L'invention concerne une plaque de contact gaz/liquide à capacité améliorée de contact gaz/liquide comprenant: une base formée d'une surface incurvée de manière à augmenter le temps de contact et la surface de contact avec un gaz ou un liquide; et une couche de revêtement de résine dont les surfaces des deux côtés de la base sont revêtues ou imprégnées, dans un état dans lequel la courbure de la base est conservée.
(KO)본 발명에 따른 기액접촉 능력이 향상된 기액접촉판은, 기체 또는 액체가 접촉시간과 접촉면적이 증가하도록 표면이 굴곡지게 형성되는 베이스와, 상기 베이스의 양쪽 표면상에 상기 베이스의 굴곡을 유지시킨 상태에서 함침 또는 코팅되는 수지코팅층이 구비되는 것을 특징으로 한다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)