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1. (WO2010114176) ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION

Pub. No.:    WO/2010/114176    International Application No.:    PCT/JP2010/056290
Publication Date: Fri Oct 08 01:59:59 CEST 2010 International Filing Date: Thu Apr 01 01:59:59 CEST 2010
IPC: G03F 7/039
Applicants: FUJIFILM Corporation
YOSHIDOME, Masahiro
HIRANO, Shuji
SAEGUSA, Hiroshi
IWATO, Kaoru
IIZUKA, Yusuke
Inventors: YOSHIDOME, Masahiro
HIRANO, Shuji
SAEGUSA, Hiroshi
IWATO, Kaoru
IIZUKA, Yusuke
Title: ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION
Abstract:
Provided is an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, the resin containing (a) a repeating unit represented by the following formula (AN-01), (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a resin that contains at least either a fluorine atom or a silicon atom and contains a repeating unit having a group capable of decomposing by the action of an alkali developer to increase the solubility in an alkali developer: wherein the variables in formula (AN-01) are defined in the description.