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1. (WO2010113925) COMPOSITION FOR ALLEVIATING ULTRAVIOLET RADIATION-INDUCED DAMAGE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2010/113925    International Application No.:    PCT/JP2010/055648
Publication Date: 07.10.2010 International Filing Date: 30.03.2010
IPC:
A61K 31/198 (2006.01), A23L 1/305 (2006.01), A61K 8/44 (2006.01), A61K 8/49 (2006.01), A61K 31/401 (2006.01), A61P 17/00 (2006.01), A61P 17/02 (2006.01), A61P 17/04 (2006.01), A61P 17/16 (2006.01), A61P 27/12 (2006.01), A61P 35/00 (2006.01), A61P 37/00 (2006.01), A61Q 17/04 (2006.01), A61Q 19/08 (2006.01)
Applicants: SHISEIDO COMPANY, LTD. [JP/JP]; 5-5, Ginza 7-chome, Chuo-ku, Tokyo 1048010 (JP) (For All Designated States Except US).
ASHIDA, Yutaka [JP/JP]; (JP) (For US Only).
TOJO, Yosuke [JP/JP]; (JP) (For US Only).
MITA, Masashi [JP/JP]; (JP) (For US Only).
MIZUMOTO, Chieko [JP/JP]; (JP) (For US Only).
SHIMADA, Shoichiro [JP/JP]; (JP) (For US Only).
MATSUMOTO, Hanayo [JP/JP]; (JP) (For US Only)
Inventors: ASHIDA, Yutaka; (JP).
TOJO, Yosuke; (JP).
MITA, Masashi; (JP).
MIZUMOTO, Chieko; (JP).
SHIMADA, Shoichiro; (JP).
MATSUMOTO, Hanayo; (JP)
Agent: USHIKI, Mamoru; 3rd Fl., Yusei Fukushi Kotohira Bldg.,14-1, Toranomon 1-chome, Minato-ku, Tokyo 1050001 (JP)
Priority Data:
2009-083077 30.03.2009 JP
2009-083078 30.03.2009 JP
2009-220983 25.09.2009 JP
Title (EN) COMPOSITION FOR ALLEVIATING ULTRAVIOLET RADIATION-INDUCED DAMAGE
(FR) COMPOSITION ATTÉNUANT LES LÉSIONS CAUSÉES PAR LES RAYONS ULTRAVIOLETS
(JA) 紫外線障害軽減組成物
Abstract: front page image
(EN)Disclosed are: a composition for alleviating ultraviolet radiation-induced damage, which can be used on a daily based and is stable and safe; and a pharmaceutical preparation, a cosmetic and a food composition, each of which comprises the composition. The composition for alleviating ultraviolet radiation-induced damage contains at least one compound selected from the group consisting of D-glutamic acid, L-glutamic acid, D-proline, D-cystine, L-cystine, and derivatives and/or salts of the aforementioned compounds. The composition can be used as an external preparation for the skin, a cosmetic composition, an anti-wrinkle agent, a sunscreen agent, a pharmaceutical composition for treating and/or preventing skin diseases, a food composition, or a pharmaceutical composition for preventing or treating cataract.
(FR)Cette invention concerne une composition atténuant les lésions causées par les rayons ultraviolets, qui peut être utilisée au quotidien et qui est stable et sans danger ; l'invention concerne également une préparation pharmaceutique, une composition cosmétique et une composition alimentaire, chacune d'elles contenant la composition. La composition atténuant les lésions causées par les rayons ultraviolets contient au moins un composé choisi dans le groupe constitué par l'acide D-glutamique, l'acide L-glutamique, la D-proline, la D-cystine, la L-cystine, ainsi que des dérivés et/ou des sels de ces composés. La composition peut être utilisée comme préparation externe pour la peau, composition cosmétique, agent anti-rides, écran solaire, composition pharmaceutique pour traiter et/ou prévenir les maladies de peau, composition alimentaire, ou composition pharmaceutique pour prévenir ou traiter la cataracte.
(JA) 日常的に使用でき、安定かつ安全な紫外線障害軽減組成物と、これを含む医薬品、化粧品及び食品組成物とを開発する。 本発明は、D-グルタミン酸、L-グルタミン酸、D-プロリン、D-システイン及びL-システインと、それらの誘導体及び/又は塩とからなる群から選択される1種類又は2種類以上の化合物を含む、紫外線障害軽減組成物を提供する。前記組成物は、皮膚外用剤と、化粧品組成物と、シワ抑制剤と、日焼け止め剤と、皮膚疾患治療用及び/又は予防用医薬品組成物と、食品組成物と、白内障の予防又は治療用医薬品組成物との場合がある。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)