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Machine translation
1. (WO2010113881) SUBSTRATE TRANSFER DEVICE AND SUBSTRATE PROCESSING DEVICE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2010/113881    International Application No.:    PCT/JP2010/055579
Publication Date: 07.10.2010 International Filing Date: 29.03.2010
IPC:
H01L 21/677 (2006.01)
Applicants: TOKYO ELECTRON LIMITED [JP/JP]; 3-1, Akasaka 5-chome, Minato-ku, Tokyo 1076325 (JP) (For All Designated States Except US).
OZAWA, Masahito [JP/JP]; (JP) (For US Only).
SASAKI, Yoshiaki [JP/JP]; (JP) (For US Only)
Inventors: OZAWA, Masahito; (JP).
SASAKI, Yoshiaki; (JP)
Agent: KATSUNUMA, Hirohito; Kyowa Patent & Law Office Room 323, Fuji Bldg. 2-3, Marunouchi 3-chome Chiyoda-ku, Tokyo 1000005 (JP)
Priority Data:
2009-087107 31.03.2009 JP
Title (EN) SUBSTRATE TRANSFER DEVICE AND SUBSTRATE PROCESSING DEVICE
(FR) DISPOSITIF DE TRANSFERT DE SUBSTRAT ET DISPOSITIF DE TRAITEMENT DE SUBSTRAT
(JA) 基板搬送装置及び基板処理装置
Abstract: front page image
(EN)Provided is a substrate transfer device equipped with a holding member that is capable of holding and horizontally moving a substrate, and a plurality of holding surfaces which have a concave surface with an arc-shaped cross section in the vertical direction and which are provided along the periphery of the substrate mounting areas in order to hold the periphery of the bottom surface of the substrate.
(FR)L'invention porte sur un dispositif de transfert de substrat équipé d'un élément de retenue qui est capable de retenir et de déplacer horizontalement un substrat, et d'une pluralité de surfaces de retenue qui ont une surface concave à section coupe transversale en forme d'arc dans la direction verticale et qui sont disposées le long de la périphérie des zones de montage de substrat afin de retenir la périphérie de la surface inférieure du substrat.
(JA) 本発明は、基板を保持して水平方向に移動可能な保持部材と、基板の下面側の周縁部を保持するために、前記保持部材における基板の載置領域の周方向に沿って複数設けられ、垂直方向の断面が円弧状の凹曲面である保持面と、を備えたことを特徴とする基板搬送装置である。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)